Projects per year
Despite this, there are many aspects of the EPMA that make it an attractive platform for all of thesetypes of semiconductor characterization, particularly when combining compositional information fromWDX with complementary and simultaneously-acquired signals. These advantages include: built-inlight optics; a stable, quantified and high-current beam; and a combined large-area and high-resolutionmapping capability. This allows the measurement of cathodoluminescence (CL), electron beam-inducedcurrent (EBIC) and electron channelling contrast imaging (ECCI) signals alongside WDX, which weapply to the investigation of visible and UV AlxInyGa1-x-yN materials, devices and nanostructures.
|Number of pages||2|
|Journal||Microscopy and Microanalysis|
|Early online date||1 Aug 2018|
|Publication status||E-pub ahead of print - 1 Aug 2018|
|Event||Microscopy & Microanalysis 2018 - Baltimore, United States|
Duration: 5 Aug 2018 → 9 Aug 2018
- electron probe microanalysis
- electron beam
- electron microscopy
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- 3 Finished
Light-controlled manufacturing of semiconductor structures: a platform for next generation processing of photonic devices
1/07/17 → 30/06/21
1/05/15 → 30/09/21