Towards microfluidic reactors for in situ synchrotron infrared studies

I. P. Silverwood; N. Al-Rifai; E. Cao; D. J. Nelson; A. Chutia; P. P. Wells; S. P. Nolan; M. D. Frogley; G. Cinque; A. Gavriilidis; C. R. A. Catlow

doi:10.1063/1.4941825

Towards microfluidic reactors for in situ synchrotron infrared studies

I. P. Silverwood, N. Al-Rifai, E. Cao, D. J. Nelson, A. Chutia, P. P. Wells, S. P. Nolan, M. D. Frogley, G. Cinque, A. Gavriilidis, C. R. A. Catlow

Pure And Applied Chemistry

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Abstract

Anodically bonded etched silicon microfluidic devices that allow infrared spectroscopic measurement of solutions are reported. These extend spatially well-resolved in situ infrared measurement to higher temperatures and pressures than previously reported, making them useful for effectively time-resolved measurement of realistic catalytic processes. A data processing technique necessary for the mitigation of interference fringes caused by multiple reflections of the probe beam is also described

Original language	English
Article number	024101
Number of pages	17
Journal	Review of Scientific Instruments
Volume	87
Early online date	19 Feb 2016
DOIs	https://doi.org/10.1063/1.4941825
Publication status	E-pub ahead of print - 19 Feb 2016

Keywords

microfluidic devices
synchrotron
infrared
spectroscopic measurement
catalytic process
interference fringes

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10.1063/1.4941825

Silverwood-etal-2016-towards-microfluidic-reactors-for-in-situ-synchrotron-infrared-studiesAccepted author manuscript, 3.04 MBLicence: CC BY-NC-SA 4.0

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title = "Towards microfluidic reactors for in situ synchrotron infrared studies",

abstract = "Anodically bonded etched silicon microfluidic devices that allow infrared spectroscopic measurement of solutions are reported. These extend spatially well-resolved in situ infrared measurement to higher temperatures and pressures than previously reported, making them useful for effectively time-resolved measurement of realistic catalytic processes. A data processing technique necessary for the mitigation of interference fringes caused by multiple reflections of the probe beam is also described",

keywords = "microfluidic devices, synchrotron, infrared, spectroscopic measurement, catalytic process, interference fringes",

author = "Silverwood, {I. P.} and N. Al-Rifai and E. Cao and Nelson, {D. J.} and A. Chutia and Wells, {P. P.} and Nolan, {S. P.} and Frogley, {M. D.} and G. Cinque and A. Gavriilidis and Catlow, {C. R. A.}",

note = "The following article has been submitted to/accepted by Review of Scientific Instruments. After it is published, it will be found at (http://scitation.aip.org/content/aip/journal/rsi).",

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doi = "10.1063/1.4941825",

language = "English",

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T1 - Towards microfluidic reactors for in situ synchrotron infrared studies

AU - Silverwood, I. P.

AU - Al-Rifai, N.

AU - Cao, E.

AU - Nelson, D. J.

AU - Chutia, A.

AU - Wells, P. P.

AU - Nolan, S. P.

AU - Frogley, M. D.

AU - Cinque, G.

AU - Gavriilidis, A.

AU - Catlow, C. R. A.

N1 - The following article has been submitted to/accepted by Review of Scientific Instruments. After it is published, it will be found at (http://scitation.aip.org/content/aip/journal/rsi).

PY - 2016/2/19

Y1 - 2016/2/19

N2 - Anodically bonded etched silicon microfluidic devices that allow infrared spectroscopic measurement of solutions are reported. These extend spatially well-resolved in situ infrared measurement to higher temperatures and pressures than previously reported, making them useful for effectively time-resolved measurement of realistic catalytic processes. A data processing technique necessary for the mitigation of interference fringes caused by multiple reflections of the probe beam is also described

AB - Anodically bonded etched silicon microfluidic devices that allow infrared spectroscopic measurement of solutions are reported. These extend spatially well-resolved in situ infrared measurement to higher temperatures and pressures than previously reported, making them useful for effectively time-resolved measurement of realistic catalytic processes. A data processing technique necessary for the mitigation of interference fringes caused by multiple reflections of the probe beam is also described

KW - microfluidic devices

KW - synchrotron

KW - infrared

KW - spectroscopic measurement

KW - catalytic process

KW - interference fringes

UR - http://scitation.aip.org/content/aip/journal/rsi

U2 - 10.1063/1.4941825

DO - 10.1063/1.4941825

M3 - Article

VL - 87

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

M1 - 024101

ER -

Towards microfluidic reactors for in situ synchrotron infrared studies

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