Thick titanium dioxide films for semiconductor photocatalysis

Andrew Mills, George Hill, Sharan Bhopal, Ivan P. Parkin, Shane O'Neill

Research output: Contribution to journalArticle

198 Citations (Scopus)

Abstract

Thick paste TiO2 films are prepared and tested for photocatalytic and photoinduced superhydrophilic (PSH) activity. The films are effective photocatalysts for the destruction of stearic acid using near or far UV and all the sol-gel films tested exhibited a quantum yield for this process of typically 0.15%. These quantum yields are significantly greater (4-8-fold) than those for titania films produced by an APCVD technique, including the commercial self-cleaning glass product Activ™. The films are mechanically robust and optically clear and, as photocatalysts for stearic acid removal, are photochemically stable and reproducible. The kinetics of stearic acid photomineralisation are zero order with an activation energy of ca. 2.5 kJ mol−1. All titania films tested, including those produced by APCVD, exhibit PSH. The light-induced fall, and dark recovery, in the water droplet contact angle made with titania paste films are similar in profile shape to those described by others for thin titania films produced by a traditional sol-gel route.
LanguageEnglish
Pages185-194
Number of pages9
JournalJournal of Photochemistry and Photobiology A: Chemistry
Volume160
Issue number3
DOIs
Publication statusPublished - 21 Aug 2003

Fingerprint

Photocatalysis
titanium oxides
Titanium dioxide
Semiconductor materials
Stearic acid
titanium
Titanium
Quantum yield
Photocatalysts
Ointments
acids
Sol-gels
gels
titanium dioxide
cleaning
destruction
Contact angle
Cleaning
Activation energy
recovery

Keywords

  • Titanium dioxide
  • Sol-gel film
  • APCVD technique
  • Photocatalysis

Cite this

Mills, Andrew ; Hill, George ; Bhopal, Sharan ; Parkin, Ivan P. ; O'Neill, Shane. / Thick titanium dioxide films for semiconductor photocatalysis. In: Journal of Photochemistry and Photobiology A: Chemistry. 2003 ; Vol. 160, No. 3. pp. 185-194.
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Thick titanium dioxide films for semiconductor photocatalysis. / Mills, Andrew; Hill, George; Bhopal, Sharan; Parkin, Ivan P.; O'Neill, Shane.

In: Journal of Photochemistry and Photobiology A: Chemistry, Vol. 160, No. 3, 21.08.2003, p. 185-194.

Research output: Contribution to journalArticle

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