Study of a 0.35 THz extended interaction oscillator driven by a pseudospark-sourced sheet electron beam

Jie Xie, Liang Zhang, Huabi Yin, Wenlong He, Kevin Ronald, A. D. R. Phelps, Xiaodong Chen, Jin Zhang, Yasir Alfadhl, Xuesong Yuan, Lin Meng, Adrian W. Cross

Research output: Contribution to journalArticle

Abstract

A compact high power extended interaction oscillator (EIO) driven by a pseudospark-sourced (PSsourced) sheet electron beam is presented at 0.35 THz. It combines the advantages of a planar interaction circuit and a sheet electron beam generated from the PS discharge, including a large beam cross section, high gain per unit length, high current density with the additional benefit of not requiring an external focusing magnetic field. Staying within what is achievable with microfabrication techniques, the influence of tolerance on the Q-value, resonance frequency, and characteristic impedance was investigated. The effect of surface roughness caused by the manufacturing method on Ohmic loss of the material surface was studied. The advanced microfabrication techniques of UV-LIGA and Nano-CNC which are capable of realizing high precision and a metal surface of sufficient smoothness, were proposed to manufacture the planar structures. The effect of plasma density in PS-sourced sheet electron beam on the resonance frequency of the EIO circuit was investigated. The simulation results showed that the output signal had a slight frequency upshift and a decrease of the output power as the plasma desnisty increased at 0.35 THz, which is consistent with the theoretical analysis. Beam–wave interaction simulations for this planar EIO predicted a peak output power of 1.8 kW at ~0.35 THz using an effective value of conductivity of 1.1 x 107 S/m to take into account the skin depth and surface roughness.
LanguageEnglish
Pages1-7
Number of pages7
JournalIEEE Transactions on Electron Devices
Publication statusAccepted/In press - 28 Nov 2019

Fingerprint

Beam plasma interactions
Electron beams
Microfabrication
Surface roughness
Networks (circuits)
Plasma density
Skin
Current density
Metals
Magnetic fields
Plasmas

Keywords

  • extended interaction oscillator (EIO)
  • high power radiation
  • pseudospark-sourced electron beam
  • sheet electron beam
  • terahertz

Cite this

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title = "Study of a 0.35 THz extended interaction oscillator driven by a pseudospark-sourced sheet electron beam",
abstract = "A compact high power extended interaction oscillator (EIO) driven by a pseudospark-sourced (PSsourced) sheet electron beam is presented at 0.35 THz. It combines the advantages of a planar interaction circuit and a sheet electron beam generated from the PS discharge, including a large beam cross section, high gain per unit length, high current density with the additional benefit of not requiring an external focusing magnetic field. Staying within what is achievable with microfabrication techniques, the influence of tolerance on the Q-value, resonance frequency, and characteristic impedance was investigated. The effect of surface roughness caused by the manufacturing method on Ohmic loss of the material surface was studied. The advanced microfabrication techniques of UV-LIGA and Nano-CNC which are capable of realizing high precision and a metal surface of sufficient smoothness, were proposed to manufacture the planar structures. The effect of plasma density in PS-sourced sheet electron beam on the resonance frequency of the EIO circuit was investigated. The simulation results showed that the output signal had a slight frequency upshift and a decrease of the output power as the plasma desnisty increased at 0.35 THz, which is consistent with the theoretical analysis. Beam–wave interaction simulations for this planar EIO predicted a peak output power of 1.8 kW at ~0.35 THz using an effective value of conductivity of 1.1 x 107 S/m to take into account the skin depth and surface roughness.",
keywords = "extended interaction oscillator (EIO), high power radiation, pseudospark-sourced electron beam, sheet electron beam, terahertz",
author = "Jie Xie and Liang Zhang and Huabi Yin and Wenlong He and Kevin Ronald and Phelps, {A. D. R.} and Xiaodong Chen and Jin Zhang and Yasir Alfadhl and Xuesong Yuan and Lin Meng and Cross, {Adrian W.}",
note = "{\circledC} {\circledC} 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.",
year = "2019",
month = "11",
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pages = "1--7",
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Study of a 0.35 THz extended interaction oscillator driven by a pseudospark-sourced sheet electron beam. / Xie, Jie; Zhang, Liang; Yin, Huabi; He, Wenlong; Ronald, Kevin; Phelps, A. D. R.; Chen, Xiaodong ; Zhang, Jin; Alfadhl, Yasir; Yuan, Xuesong; Meng, Lin; Cross, Adrian W.

In: IEEE Transactions on Electron Devices, 28.11.2019, p. 1-7.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Study of a 0.35 THz extended interaction oscillator driven by a pseudospark-sourced sheet electron beam

AU - Xie, Jie

AU - Zhang, Liang

AU - Yin, Huabi

AU - He, Wenlong

AU - Ronald, Kevin

AU - Phelps, A. D. R.

AU - Chen, Xiaodong

AU - Zhang, Jin

AU - Alfadhl, Yasir

AU - Yuan, Xuesong

AU - Meng, Lin

AU - Cross, Adrian W.

N1 - © © 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.

PY - 2019/11/28

Y1 - 2019/11/28

N2 - A compact high power extended interaction oscillator (EIO) driven by a pseudospark-sourced (PSsourced) sheet electron beam is presented at 0.35 THz. It combines the advantages of a planar interaction circuit and a sheet electron beam generated from the PS discharge, including a large beam cross section, high gain per unit length, high current density with the additional benefit of not requiring an external focusing magnetic field. Staying within what is achievable with microfabrication techniques, the influence of tolerance on the Q-value, resonance frequency, and characteristic impedance was investigated. The effect of surface roughness caused by the manufacturing method on Ohmic loss of the material surface was studied. The advanced microfabrication techniques of UV-LIGA and Nano-CNC which are capable of realizing high precision and a metal surface of sufficient smoothness, were proposed to manufacture the planar structures. The effect of plasma density in PS-sourced sheet electron beam on the resonance frequency of the EIO circuit was investigated. The simulation results showed that the output signal had a slight frequency upshift and a decrease of the output power as the plasma desnisty increased at 0.35 THz, which is consistent with the theoretical analysis. Beam–wave interaction simulations for this planar EIO predicted a peak output power of 1.8 kW at ~0.35 THz using an effective value of conductivity of 1.1 x 107 S/m to take into account the skin depth and surface roughness.

AB - A compact high power extended interaction oscillator (EIO) driven by a pseudospark-sourced (PSsourced) sheet electron beam is presented at 0.35 THz. It combines the advantages of a planar interaction circuit and a sheet electron beam generated from the PS discharge, including a large beam cross section, high gain per unit length, high current density with the additional benefit of not requiring an external focusing magnetic field. Staying within what is achievable with microfabrication techniques, the influence of tolerance on the Q-value, resonance frequency, and characteristic impedance was investigated. The effect of surface roughness caused by the manufacturing method on Ohmic loss of the material surface was studied. The advanced microfabrication techniques of UV-LIGA and Nano-CNC which are capable of realizing high precision and a metal surface of sufficient smoothness, were proposed to manufacture the planar structures. The effect of plasma density in PS-sourced sheet electron beam on the resonance frequency of the EIO circuit was investigated. The simulation results showed that the output signal had a slight frequency upshift and a decrease of the output power as the plasma desnisty increased at 0.35 THz, which is consistent with the theoretical analysis. Beam–wave interaction simulations for this planar EIO predicted a peak output power of 1.8 kW at ~0.35 THz using an effective value of conductivity of 1.1 x 107 S/m to take into account the skin depth and surface roughness.

KW - extended interaction oscillator (EIO)

KW - high power radiation

KW - pseudospark-sourced electron beam

KW - sheet electron beam

KW - terahertz

M3 - Article

SP - 1

EP - 7

JO - IEEE Transactions on Electron Devices

T2 - IEEE Transactions on Electron Devices

JF - IEEE Transactions on Electron Devices

SN - 0018-9383

ER -