Abstract
We previously proposed a dual FEL configuration on the UV Demo FEL at
Jefferson Lab that would allow simultaneous lasing at FIR and UV wavelengths [1]. The FIR source would be an FEL oscillator with a short wiggler providing diffraction-limited pulses with pulse energy exceeding 50 microJoules, using the exhaust beam from a UVFEL as the input electron beam. Since the UV FEL requires very short pulses, the input to the FIR FEL is extremely short compared to a slippage length and the usual Slowly Varying Envelope Approximation (SVEA) does not apply. We use a non-SVEA code [2] to simulate this system both with a small energy spread (UV laser off) and with large energy spread (UV laser on).
Jefferson Lab that would allow simultaneous lasing at FIR and UV wavelengths [1]. The FIR source would be an FEL oscillator with a short wiggler providing diffraction-limited pulses with pulse energy exceeding 50 microJoules, using the exhaust beam from a UVFEL as the input electron beam. Since the UV FEL requires very short pulses, the input to the FIR FEL is extremely short compared to a slippage length and the usual Slowly Varying Envelope Approximation (SVEA) does not apply. We use a non-SVEA code [2] to simulate this system both with a small energy spread (UV laser off) and with large energy spread (UV laser on).
Original language | English |
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Article number | 012025 |
Pages (from-to) | 1-7 |
Number of pages | 7 |
Journal | Journal of Physics Conference Series |
Volume | 493 |
Issue number | conference 1 |
DOIs | |
Publication status | Published - 2014 |
Keywords
- simulations
- FIR oscillator
- large slippage parameter
- jefferson lab
- FIR/UV
- pump-probe experiments
- dual FEL configuration
- simultaneous lasing
- diffraction-limited pulses
- short wiggler