Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

R J Dance, N M H Butler, R J Gray, D A MacLellan, D R Rusby, G G Scott, B Zielbauer, V Bagnoud, H Xu, A P L Robinson, M P Desjarlais, D Neely, P McKenna

Research output: Contribution to journalSpecial issue

1 Citation (Scopus)

Abstract

The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

Fingerprint

Electron beams
electron beams
electrical resistivity
Carbon
carbon
Electron sources
Temperature
temperature
electron sources
electron distribution
beam currents
Laser pulses
Diamonds
Current density
diamonds
current density
Electrons
pulses
lasers
electrons

Keywords

  • dense plasma
  • fast-electron transport
  • laserplasma interactions

Cite this

Dance, R J ; Butler, N M H ; Gray, R J ; MacLellan, D A ; Rusby, D R ; Scott, G G ; Zielbauer, B ; Bagnoud, V ; Xu, H ; Robinson, A P L ; Desjarlais, M P ; Neely, D ; McKenna, P. / Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon. In: Plasma Physics and Controlled Fusion. 2015 ; Vol. 58, No. 1.
@article{21069e14944c477e97cde8fd583fa7c3,
title = "Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon",
abstract = "The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.",
keywords = "dense plasma, fast-electron transport, laserplasma interactions",
author = "Dance, {R J} and Butler, {N M H} and Gray, {R J} and MacLellan, {D A} and Rusby, {D R} and Scott, {G G} and B Zielbauer and V Bagnoud and H Xu and Robinson, {A P L} and Desjarlais, {M P} and D Neely and P McKenna",
year = "2015",
month = "11",
day = "13",
doi = "10.1088/0741-3335/58/1/014027",
language = "English",
volume = "58",
journal = "Plasma Physics and Controlled Fusion",
issn = "0741-3335",
number = "1",

}

Dance, RJ, Butler, NMH, Gray, RJ, MacLellan, DA, Rusby, DR, Scott, GG, Zielbauer, B, Bagnoud, V, Xu, H, Robinson, APL, Desjarlais, MP, Neely, D & McKenna, P 2015, 'Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon' Plasma Physics and Controlled Fusion, vol. 58, no. 1, 014027. https://doi.org/10.1088/0741-3335/58/1/014027

Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon. / Dance, R J; Butler, N M H; Gray, R J; MacLellan, D A; Rusby, D R; Scott, G G; Zielbauer, B; Bagnoud, V; Xu, H; Robinson, A P L; Desjarlais, M P; Neely, D; McKenna, P.

In: Plasma Physics and Controlled Fusion, Vol. 58, No. 1, 014027, 13.11.2015.

Research output: Contribution to journalSpecial issue

TY - JOUR

T1 - Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

AU - Dance, R J

AU - Butler, N M H

AU - Gray, R J

AU - MacLellan, D A

AU - Rusby, D R

AU - Scott, G G

AU - Zielbauer, B

AU - Bagnoud, V

AU - Xu, H

AU - Robinson, A P L

AU - Desjarlais, M P

AU - Neely, D

AU - McKenna, P

PY - 2015/11/13

Y1 - 2015/11/13

N2 - The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

AB - The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

KW - dense plasma

KW - fast-electron transport

KW - laserplasma interactions

UR - http://iopscience.iop.org/0741-3335

UR - http://www.ipfn.ist.utl.pt/EPS2015/

U2 - 10.1088/0741-3335/58/1/014027

DO - 10.1088/0741-3335/58/1/014027

M3 - Special issue

VL - 58

JO - Plasma Physics and Controlled Fusion

T2 - Plasma Physics and Controlled Fusion

JF - Plasma Physics and Controlled Fusion

SN - 0741-3335

IS - 1

M1 - 014027

ER -