Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

R J Dance; N M H Butler; R J Gray; D A MacLellan; D R Rusby; G G Scott; B Zielbauer; V Bagnoud; H Xu; A P L Robinson; M P Desjarlais; D Neely; P McKenna

doi:10.1088/0741-3335/58/1/014027

Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

R J Dance, N M H Butler, R J Gray, D A MacLellan, D R Rusby, G G Scott, B Zielbauer, V Bagnoud, H Xu, A P L Robinson, M P Desjarlais, D Neely, P McKenna

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Abstract

The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-10²⁰ Wcm^-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

Original language	English
Article number	014027
Number of pages	9
Journal	Plasma Physics and Controlled Fusion
Volume	58
Issue number	1
DOIs	https://doi.org/10.1088/0741-3335/58/1/014027
Publication status	Published - 13 Nov 2015
Event	42nd European Physical Society Conference on Plasma Physics - Centro Cultural de Belem, Lisbon, Portugal Duration: 22 Jun 2015 → 26 Jun 2015

Keywords

dense plasma
fast-electron transport
laserplasma interactions

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10.1088/0741-3335/58/1/014027

Dance-etal-PPCF2015-lattice-structure-and-low-temperature-resistivity-on-fast-electron-beamAccepted author manuscript, 3.28 MB

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Dance, R. J., Butler, N. M. H., Gray, R. J., MacLellan, D. A., Rusby, D. R., Scott, G. G., Zielbauer, B., Bagnoud, V., Xu, H., Robinson, A. P. L., Desjarlais, M. P., Neely, D., & McKenna, P. (2015). Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon. Plasma Physics and Controlled Fusion, 58(1), Article 014027. https://doi.org/10.1088/0741-3335/58/1/014027

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title = "Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon",

abstract = "The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.",

keywords = "dense plasma, fast-electron transport, laserplasma interactions",

author = "Dance, {R J} and Butler, {N M H} and Gray, {R J} and MacLellan, {D A} and Rusby, {D R} and Scott, {G G} and B Zielbauer and V Bagnoud and H Xu and Robinson, {A P L} and Desjarlais, {M P} and D Neely and P McKenna",

year = "2015",

month = nov,

day = "13",

doi = "10.1088/0741-3335/58/1/014027",

language = "English",

volume = "58",

journal = "Plasma Physics and Controlled Fusion",

issn = "0741-3335",

number = "1",

note = "42nd European Physical Society Conference on Plasma Physics ; Conference date: 22-06-2015 Through 26-06-2015",

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Dance, RJ, Butler, NMH, Gray, RJ, MacLellan, DA, Rusby, DR, Scott, GG, Zielbauer, B, Bagnoud, V, Xu, H, Robinson, APL, Desjarlais, MP, Neely, D & McKenna, P 2015, 'Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon', Plasma Physics and Controlled Fusion, vol. 58, no. 1, 014027. https://doi.org/10.1088/0741-3335/58/1/014027

TY - JOUR

T1 - Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

AU - Dance, R J

AU - Butler, N M H

AU - Gray, R J

AU - MacLellan, D A

AU - Rusby, D R

AU - Scott, G G

AU - Zielbauer, B

AU - Bagnoud, V

AU - Xu, H

AU - Robinson, A P L

AU - Desjarlais, M P

AU - Neely, D

AU - McKenna, P

PY - 2015/11/13

Y1 - 2015/11/13

N2 - The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

AB - The influence of low temperature (eV to tens-of-eV) electrical resistivity on the onset of the filamentation instability in fast-electron transport is investigated in targets comprising of layers of ordered (diamond) and disordered (vitreous) carbon. It is shown experimentally and numerically that the thickness of the disordered carbon layer influences the degree of filamentation of the fast-electron beam. Strong filamentation is produced if the thickness is of the order of 60 μm or greater, for an electron distribution driven by a sub-picosecond, mid-1020 Wcm-2 laser pulse. It is shown that the position of the vitreous carbon layer relative to the fast-electron source (where the beam current density and background temperature are highest) does not have a strong effect because the resistive filamentation growth rate is high in disordered carbon over a wide range of temperatures up to the Spitzer regime.

KW - dense plasma

KW - fast-electron transport

KW - laserplasma interactions

UR - http://iopscience.iop.org/0741-3335

UR - http://www.ipfn.ist.utl.pt/EPS2015/

U2 - 10.1088/0741-3335/58/1/014027

DO - 10.1088/0741-3335/58/1/014027

M3 - Special issue

SN - 0741-3335

VL - 58

JO - Plasma Physics and Controlled Fusion

JF - Plasma Physics and Controlled Fusion

IS - 1

M1 - 014027

T2 - 42nd European Physical Society Conference on Plasma Physics

Y2 - 22 June 2015 through 26 June 2015

ER -

Role of lattice structure and low temperature resistivity on fast electron beam filamentation in carbon

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