@inproceedings{520d135c6e464a799c1f0c7c0ddf8b27,
title = "Recovery kinetics of phosphorus ion-implanted a-Si:H",
abstract = "This chapter looks at recovery kinetics of phosphorus ion-implanted a-Si:H",
keywords = "recovery kinetics, phosphorus, ion-implanted",
author = "J. Nakata and S. Wagner and Helena Gleskova and Stolk, {P. A.} and Poate, {J. M.}",
year = "1996",
month = dec,
day = "31",
language = "English",
isbn = "9781558993235",
volume = "420",
series = "MRS Symposium Proceedings",
publisher = "Materials Research Society",
pages = "653--658",
editor = "M. Hack and A. Matsuda and Schiff, {E. A.} and R. Schropp and S. Wagner",
booktitle = "Amorphous silicon technology - 1996",
note = "MRS Spring Meeting 1996 ; Conference date: 08-04-1996 Through 12-04-1996",
}