Abstract
| Original language | English |
|---|---|
| Article number | 055001 |
| Pages (from-to) | 1-17 |
| Number of pages | 18 |
| Journal | Journal of Physics B: Atomic, Molecular and Optical Physics |
| Volume | 52 |
| Issue number | 5 |
| Early online date | 7 Dec 2018 |
| DOIs | |
| Publication status | Published - 8 Feb 2019 |
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Keywords
- ion trap
- trapped ions
- quantum coherence
- microplasma
- spectroscopy
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Radio-frequency microplasmas with energies suited to in situ selective cleaning of surface adsorbates in ion microtraps. / Akhtar, Mariam; Wilpers, Guido ; Choonee, Kaushal ; Riis, Erling; Sinclair, Alastair G.
In: Journal of Physics B: Atomic, Molecular and Optical Physics, Vol. 52, No. 5, 055001, 08.02.2019, p. 1-17.Research output: Contribution to journal › Article
TY - JOUR
T1 - Radio-frequency microplasmas with energies suited to in situ selective cleaning of surface adsorbates in ion microtraps
AU - Akhtar, Mariam
AU - Wilpers, Guido
AU - Choonee, Kaushal
AU - Riis, Erling
AU - Sinclair, Alastair G
PY - 2019/2/8
Y1 - 2019/2/8
N2 - We have demonstrated a capacitively-coupled, radio-frequency (RF) microplasma inside the 3D electrode structure of an ion microtrap device. For this work, devices with an inter-electrode distance of 340 μm were used. The microplasmas were operated at Ω RF /2π = 23 MHz, in both He and He:N2 gas mixtures, over a range of RF amplitudes (140–220 V) and pressures (250–910 mbar). Spectroscopic analysis of the He I 667 nm and Hα 656 nm emission lines yielded the gas temperature and electron density, which enabled calculation of the mean ion bombardment energy. For the range of operating parameters studied, we calculated mean He+ energies to be between 0.3 and 4.1 eV. While these energies are less than the threshold for He sputtering of hydrocarbon adsorbates on Au, we calculate that the high energy tail of the distribution should remove adsorbate monolayers in as little as 1 min of processing. We also calculate that the distribution is insufficiently energetic to have any significant effect on the Au electrode surface within that duration. Our results suggest that the microplasma technique is suited to in situ selective removal of surface adsorbates from ion microtrap electrodes.
AB - We have demonstrated a capacitively-coupled, radio-frequency (RF) microplasma inside the 3D electrode structure of an ion microtrap device. For this work, devices with an inter-electrode distance of 340 μm were used. The microplasmas were operated at Ω RF /2π = 23 MHz, in both He and He:N2 gas mixtures, over a range of RF amplitudes (140–220 V) and pressures (250–910 mbar). Spectroscopic analysis of the He I 667 nm and Hα 656 nm emission lines yielded the gas temperature and electron density, which enabled calculation of the mean ion bombardment energy. For the range of operating parameters studied, we calculated mean He+ energies to be between 0.3 and 4.1 eV. While these energies are less than the threshold for He sputtering of hydrocarbon adsorbates on Au, we calculate that the high energy tail of the distribution should remove adsorbate monolayers in as little as 1 min of processing. We also calculate that the distribution is insufficiently energetic to have any significant effect on the Au electrode surface within that duration. Our results suggest that the microplasma technique is suited to in situ selective removal of surface adsorbates from ion microtrap electrodes.
KW - ion trap
KW - trapped ions
KW - quantum coherence
KW - microplasma
KW - spectroscopy
UR - https://iopscience.iop.org/journal/0953-4075
U2 - 10.1088/1361-6455/aaf704
DO - 10.1088/1361-6455/aaf704
M3 - Article
VL - 52
SP - 1
EP - 17
JO - Journal of Physics B: Atomic, Molecular and Optical Physics
JF - Journal of Physics B: Atomic, Molecular and Optical Physics
SN - 0953-4075
IS - 5
M1 - 055001
ER -