Photocatalytically active gamma-WO3 films from the atmospheric pressure CVD of WOCl4 with ethyl acetate or ethanol

S. O'Neill, I.P. Parkin, R.J.H. Clark, A. Mills, N. Elliott

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

Communication: Coatings Of Yellow gamma-WO3 are deposited on glass by APCVD of WOCl4 and either ethanol or ethylacetate at 350-450degreesC. The yellow films show significant photoactivity for the destruction of stearic acid, and photoinduced superhydrophilicity. Preparation of blue reduced WO2.92 films from the same reaction at higher substrate temperatures of 500-600degreesC (Figure) is also found to be possible. These films show no photoactivity, but can be converted into the fully stoichiometric photoactive form simply by heating in air.
Original languageEnglish
Pages (from-to)136-141
Number of pages5
JournalChemical Vapor Deposition
Volume10
Issue number3
DOIs
Publication statusPublished - Jun 2004

Keywords

  • OXIDE THIN-FILMS
  • CHEMICAL-VAPOR-DEPOSITION
  • SEMICONDUCTOR PHOTOCATALYSIS
  • WO3
  • OXIDATION
  • TIO2

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