One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask

J. Yao, D.G. Uttamchandani, Y. Zhang, Y. Guo, Z. Cui

Research output: Contribution to conferencePaper

3 Citations (Scopus)

Abstract

Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.
Original languageEnglish
Pages130-137
Number of pages7
DOIs
Publication statusPublished - Oct 2002
EventConference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly - Brugge, Belgium
Duration: 28 Oct 200229 Oct 2002

Conference

ConferenceConference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly
CountryBelgium
CityBrugge
Period28/10/0229/10/02

Keywords

  • hybrid element
  • micro optics
  • achromatism
  • coding grey-level mask
  • one-step
  • lithography
  • fabrication
  • hybrid microlens array

Fingerprint Dive into the research topics of 'One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask'. Together they form a unique fingerprint.

  • Cite this

    Yao, J., Uttamchandani, D. G., Zhang, Y., Guo, Y., & Cui, Z. (2002). One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. 130-137. Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium. https://doi.org/10.1117/12.468419