One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask

J. Yao, D.G. Uttamchandani, Y. Zhang, Y. Guo, Z. Cui

Research output: Contribution to conferencePaper

3 Citations (Scopus)

Abstract

Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.

Conference

ConferenceConference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly
CountryBelgium
CityBrugge
Period28/10/0229/10/02

Fingerprint

coding
masks
lithography
fabrication
photoresists
aberration
coherent light
layouts
computer programs
physics
profiles

Keywords

  • hybrid element
  • micro optics
  • achromatism
  • coding grey-level mask
  • one-step
  • lithography
  • fabrication
  • hybrid microlens array

Cite this

Yao, J., Uttamchandani, D. G., Zhang, Y., Guo, Y., & Cui, Z. (2002). One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. 130-137. Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium. https://doi.org/10.1117/12.468419
Yao, J. ; Uttamchandani, D.G. ; Zhang, Y. ; Guo, Y. ; Cui, Z. / One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium.7 p.
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title = "One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask",
abstract = "Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.",
keywords = "hybrid element, micro optics , achromatism, coding grey-level mask, one-step, lithography, fabrication, hybrid microlens array",
author = "J. Yao and D.G. Uttamchandani and Y. Zhang and Y. Guo and Z. Cui",
year = "2002",
month = "10",
doi = "10.1117/12.468419",
language = "English",
pages = "130--137",
note = "Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly ; Conference date: 28-10-2002 Through 29-10-2002",

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Yao, J, Uttamchandani, DG, Zhang, Y, Guo, Y & Cui, Z 2002, 'One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask' Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium, 28/10/02 - 29/10/02, pp. 130-137. https://doi.org/10.1117/12.468419

One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. / Yao, J.; Uttamchandani, D.G.; Zhang, Y.; Guo, Y.; Cui, Z.

2002. 130-137 Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium.

Research output: Contribution to conferencePaper

TY - CONF

T1 - One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask

AU - Yao, J.

AU - Uttamchandani, D.G.

AU - Zhang, Y.

AU - Guo, Y.

AU - Cui, Z.

PY - 2002/10

Y1 - 2002/10

N2 - Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.

AB - Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.

KW - hybrid element

KW - micro optics

KW - achromatism

KW - coding grey-level mask

KW - one-step

KW - lithography

KW - fabrication

KW - hybrid microlens array

UR - http://dx.doi.org/10.1117/12.468419

U2 - 10.1117/12.468419

DO - 10.1117/12.468419

M3 - Paper

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ER -

Yao J, Uttamchandani DG, Zhang Y, Guo Y, Cui Z. One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. 2002. Paper presented at Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly , Brugge, Belgium. https://doi.org/10.1117/12.468419