On interface properties of very-thin and ultra-thin oxide/a-Si:H structures prepared by both oxygen based plasmas and chemical oxidation

E. Pincik, H. Kobayashi, Helena Gleskova, M. Takahashi, M. Jergel , R. Brunner, L. Ortega, M. Kucera , J. Rusnak

Research output: Chapter in Book/Report/Conference proceedingConference contribution book

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