On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation

E. Pincik, H. Kobayashi, R. Hajossy, H. Gleskova, M. Takahashi, M. Jergel, R. Brunner, L. Ortega, M. Kucera, M. Kral, J. Rusnak

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Chemical Compounds