Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices

A.J.C. Kuehne, A.R. Mackintosh, R.A. Pethrick, B. Tieke

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.
Original languageEnglish
Pages (from-to)4722-4724
Number of pages2
JournalTetrahedron Letters
Volume49
Issue number32
DOIs
Publication statusPublished - 4 Aug 2008

Keywords

  • crosslinkable polymer
  • conjugated polymer
  • vinyl ether functionalized fluorene
  • photoresist
  • polymer blends
  • photolithography

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