Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices

A.J.C. Kuehne; A.R. Mackintosh; R.A. Pethrick; B. Tieke

doi:10.1016/j.tetlet.2008.05.133

Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices

A.J.C. Kuehne, A.R. Mackintosh, R.A. Pethrick, B. Tieke

Pure And Applied Chemistry

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.

Original language	English
Pages (from-to)	4722-4724
Number of pages	2
Journal	Tetrahedron Letters
Volume	49
Issue number	32
DOIs	https://doi.org/10.1016/j.tetlet.2008.05.133
Publication status	Published - 4 Aug 2008

Keywords

crosslinkable polymer
conjugated polymer
vinyl ether functionalized fluorene
photoresist
polymer blends
photolithography

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10.1016/j.tetlet.2008.05.133

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title = "Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices",

abstract = "A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.",

keywords = "crosslinkable polymer, conjugated polymer, vinyl ether functionalized fluorene, photoresist, polymer blends, photolithography",

author = "A.J.C. Kuehne and A.R. Mackintosh and R.A. Pethrick and B. Tieke",

year = "2008",

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language = "English",

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AU - Kuehne, A.J.C.

AU - Mackintosh, A.R.

AU - Pethrick, R.A.

AU - Tieke, B.

PY - 2008/8/4

Y1 - 2008/8/4

N2 - A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.

AB - A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.

KW - crosslinkable polymer

KW - conjugated polymer

KW - vinyl ether functionalized fluorene

KW - photoresist

KW - polymer blends

KW - photolithography

UR - http://dx.doi.org/10.1016/j.tetlet.2008.05.133

U2 - 10.1016/j.tetlet.2008.05.133

DO - 10.1016/j.tetlet.2008.05.133

M3 - Article

SN - 0040-4039

VL - 49

SP - 4722

EP - 4724

JO - Tetrahedron Letters

JF - Tetrahedron Letters

IS - 32

ER -

Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices

Abstract

Keywords

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