Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies

The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.