Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies

Mairi E. Sandison, Jonathan M. Cooper

Research output: Contribution to journalArticle

87 Citations (Scopus)

Abstract

The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.

LanguageEnglish
Pages1020-1025
Number of pages6
JournalLab on a Chip
Volume6
Issue number8
Early online date21 Jun 2006
DOIs
Publication statusPublished - Aug 2006

Fingerprint

Nanoimprint lithography
Nanotechnology
Electron beams
Electrodes
Electrons
Costs and Cost Analysis
Equipment and Supplies
Electron beam lithography
Fabrication
Sensors
Costs

Keywords

  • electrode arrays
  • nanoimprint lithography
  • electroanalytical sensors

Cite this

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Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies. / Sandison, Mairi E.; Cooper, Jonathan M.

In: Lab on a Chip, Vol. 6, No. 8, 08.2006, p. 1020-1025.

Research output: Contribution to journalArticle

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