We describe a technique for fabricating micro- and nanostructures incorporating fluorescent defects in diamond with a positional accuracy better than hundreds of nanometers. Using confocal fluorescence microscopy and focused ion beametching, we initially locate a suitable defect with respect to registration marks on the diamondsurface then etch a structure using these coordinates. We demonstrate the technique by etching an 8 μm diameter hemisphere positioned with single negatively charged nitrogen-vacancy defect lies at its origin. Direct comparison of the fluorescencephoton count rate before and after fabrication shows an eightfold increase due to the presence of the hemisphere.
- solid immersion lenses
- confocal fluorescence microscopy
- focused ion beam (FIB) etching