Nanoelectrode lithography of silicon surface by brass stamp

Rashed Md. Murad Hasan, Fei Ding, Jining Sun, Xichun Luo, Andrew Cox

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Abstract

The stamps used in the nanoelectrode lithography (NEL) process require conductive layer deposition, which makes them a bit expensive. This paper reports the feasibility of using brass materials as the conductive stamps for NEL to shorten the process step and reduce the production cost. In this paper, the fabrication of nanostructures on the brass stamp was performed on a single point diamond turning (SPDT) machine. Some burrs were formed during the machining process, that prohibit the stamps from achieving a homogeneous contact with the substrates. Introduction of a thin layer of polymer (PS-OH) on the silicon substrate showed an improvement in contact uniformity so as the oxidation. However, some areas of the substrate remained unoxidized as few of the burrs were quite large. The brass stamps could be advantageous as they show no degradation after many uses. Nevertheless, the issues of the burr formation and non-uniformity should be alleviated first to make these stamps appropriate to the NEL process.
Original languageEnglish
Number of pages11
Publication statusPublished - 19 Oct 2021
Event7th International Conference on Nanomanufacturing - Xi'An, China
Duration: 15 Oct 202117 Oct 2021
https://www.aet-ac.org/News/7th-International-Conference-on-Nanomanufacturing%EF%BC%88nanoMan2021%EF%BC%89

Conference

Conference7th International Conference on Nanomanufacturing
Country/TerritoryChina
CityXi'An
Period15/10/2117/10/21
Internet address

Keywords

  • nanolithography
  • anodic oxidation
  • SPDT
  • Burrs
  • polystyrene

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