Molecular beam epitaxy as a method for the growth of free-standing bulk zinc-blende GaN and AlGaN crystals

S.V. Novikov, C.R. Staddon, C.T. Foxon, Franziska Luckert, Paul Edwards, Robert Martin, A.J. Kent

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

We have studied the growth of zinc-blende GaN and AlxGa1-xN layers, structures and bulk crystals by molecular beam epitaxy (MBE). MBE is normally regarded as an epitaxial technique for growth of very thin layers with monolayer control of their thickness. However, we have used the MBE technique for bulk crystal growth and have produced GaN layers up to 100 mu m in thickness. Thick, undoped, cubic GaN films were grown on semi-insulating GaAs (0 0 1) substrates by a modified plasma-assisted molecular beam epitaxy (PA-MBE) method and were removed from the GaAs substrate after the growth. The resulting free-standing GaN wafers may be used as substrates for further epitaxy of cubic GaN-based structures and devices. We have demonstrated that the PA-MBE process, we had developed, also allows us to achieve free-standing zinc-blende AlxGa1-xN wafers.

Original languageEnglish
Pages (from-to)80-83
Number of pages4
JournalJournal of Crystal Growth
Volume323
Issue number1
DOIs
Publication statusPublished - 15 May 2011

Keywords

  • substrates
  • molecular beam epitaxy
  • nitrides
  • semiconducting III–V materials
  • free-standing bulk
  • zinc-blende GaN
  • AlGaN crystals

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