Microplasma-induced surface engineering of silicon nanocrystals in colloidal dispersion

V. Švrček; D. Mariotti; M. Kondo

doi:10.1063/1.3505329

Microplasma-induced surface engineering of silicon nanocrystals in colloidal dispersion

V. Švrček^*, D. Mariotti, M. Kondo

^*Corresponding author for this work

Design, Manufacturing And Engineering Management

Research output: Contribution to journal › Article › peer-review

58 Citations (Scopus)

Abstract

We report on an atmospheric-pressure dc microplasma that can be used to passivate silicon nanocrystals (SiNCs) in ethanol and that stabilizes their optoelectronic properties. We show that microplasma processing enhances the SiNCs photoluminescence intensity by factor of more than ten times and ∼80 nm redshift of its maximum. The microplasma induces the replacement of hydrogen terminations with hydroxyl-/organic-based bonds. The resulting surface characteristics are responsible for the formation of conductive and stable SiNCs self-organized assemblies extending over 0.5 mm after dewetting on a substrate.

Original language	English
Article number	161502
Journal	Applied Physics Letters
Volume	97
Issue number	16
DOIs	https://doi.org/10.1063/1.3505329
Publication status	Published - 18 Oct 2010

Funding

This work was partially supported by a NEDO Project (Japan). D.M. gratefully acknowledges the support of the JSPS Invitation Fellowship (Japan).

Keywords

colloids
doppler effect
self assembly
photoluminescence
optoelectronic properties
leptons
transition metals
chemical elements
liquid solid interfaces
plasmas

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10.1063/1.3505329

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title = "Microplasma-induced surface engineering of silicon nanocrystals in colloidal dispersion",

abstract = "We report on an atmospheric-pressure dc microplasma that can be used to passivate silicon nanocrystals (SiNCs) in ethanol and that stabilizes their optoelectronic properties. We show that microplasma processing enhances the SiNCs photoluminescence intensity by factor of more than ten times and ∼80 nm redshift of its maximum. The microplasma induces the replacement of hydrogen terminations with hydroxyl-/organic-based bonds. The resulting surface characteristics are responsible for the formation of conductive and stable SiNCs self-organized assemblies extending over 0.5 mm after dewetting on a substrate.",

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author = "V. {\v S}vr{\v c}ek and D. Mariotti and M. Kondo",

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language = "English",

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T1 - Microplasma-induced surface engineering of silicon nanocrystals in colloidal dispersion

AU - Švrček, V.

AU - Mariotti, D.

AU - Kondo, M.

PY - 2010/10/18

Y1 - 2010/10/18

N2 - We report on an atmospheric-pressure dc microplasma that can be used to passivate silicon nanocrystals (SiNCs) in ethanol and that stabilizes their optoelectronic properties. We show that microplasma processing enhances the SiNCs photoluminescence intensity by factor of more than ten times and ∼80 nm redshift of its maximum. The microplasma induces the replacement of hydrogen terminations with hydroxyl-/organic-based bonds. The resulting surface characteristics are responsible for the formation of conductive and stable SiNCs self-organized assemblies extending over 0.5 mm after dewetting on a substrate.

AB - We report on an atmospheric-pressure dc microplasma that can be used to passivate silicon nanocrystals (SiNCs) in ethanol and that stabilizes their optoelectronic properties. We show that microplasma processing enhances the SiNCs photoluminescence intensity by factor of more than ten times and ∼80 nm redshift of its maximum. The microplasma induces the replacement of hydrogen terminations with hydroxyl-/organic-based bonds. The resulting surface characteristics are responsible for the formation of conductive and stable SiNCs self-organized assemblies extending over 0.5 mm after dewetting on a substrate.

KW - colloids

KW - doppler effect

KW - self assembly

KW - photoluminescence

KW - optoelectronic properties

KW - leptons

KW - transition metals

KW - chemical elements

KW - liquid solid interfaces

KW - plasmas

U2 - 10.1063/1.3505329

DO - 10.1063/1.3505329

M3 - Article

AN - SCOPUS:77958473357

SN - 0003-6951

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 16

M1 - 161502

ER -

Microplasma-induced surface engineering of silicon nanocrystals in colloidal dispersion

Abstract

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Keywords

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