Abstract
A process sequence is disclosed for fabricating arrays of Thin Film Transistors by printing metallic conductors for the gate and data lines and possibly the Indium Tin Oxide Pixel electrode as well. The process eliminates conventional step-and-repeat photolithographic patterning, and provides high conductivity metallization for large arrays. These arrays may be used in displays, detectors and scanners.
Original language | English |
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Patent number | US6274412 |
IPC | G01G 336 |
Publication status | Published - 14 Aug 2001 |
Keywords
- thin film transistors
- metallic conductors
- metallization