Mass transfer considerations during pulse plating

S. Roy*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

A conceptual description of material transport through a liquid phase diffusion layer during pulse and reverse pulse current plating is provided. The formation of a dual diffusion layer, with an inner pulsating diffusion layer and an outer, unaffected diffusion layer is described. The quantification of these two layers using limiting current experiments and theoretical analysis is discussed. Based on these material transfer phenomena, the basis of selection of pulse parameters is shown. The step by step approach to use these mass transfer equations as a set of design rules, and their subsequent use in a graph to select pulse and reverse pulse parameters is described.

Original languageEnglish
Pages (from-to)87-91
Number of pages5
JournalTransactions of the Institute of Metal Finishing
Volume86
Issue number2
DOIs
Publication statusPublished - 1 Mar 2008

Keywords

  • dual diffusion layer
  • mass transfer
  • pulse current
  • pulse deposition
  • pulse limiting current
  • pulse parameters
  • pulse plating

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