Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfstrom; B.J.E. Guilhabert; J. McKendry; S.P. Poland; Z. Gong; D. Massoubre; G.J. Valentine; E. Gu; M.D. Dawson; E. Richardson; B.R. Rae; G. Blanco-Gomez; J.M. Cooper; R.K. Henderson

doi:10.1364/OE.17.023522

Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfstrom, B.J.E. Guilhabert, J. McKendry, S.P. Poland, Z. Gong, D. Massoubre, G.J. Valentine, E. Gu, M.D. Dawson, E. Richardson, B.R. Rae, G. Blanco-Gomez, J.M. Cooper, R.K. Henderson

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.

Original language	English
Pages (from-to)	23522-23529
Number of pages	7
Journal	Optics Express
Volume	17
Issue number	26
DOIs	https://doi.org/10.1364/OE.17.023522
Publication status	Published - 21 Dec 2009

Keywords

ultraviolet photolithography
micro-pixel
diodes

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10.1364/OE.17.023522

Semiconductor-Based Hybrid Structures for Ultraviolet Micro-Devices
Dawson, M. (Principal Investigator), Calvez, S. (Co-investigator), Martin, R. (Co-investigator) & Watson, I. (Co-investigator)
EPSRC (Engineering and Physical Sciences Research Council)
1/01/07 → 31/12/10
Project: Research

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Elfstrom, D., Guilhabert, B. J. E., McKendry, J., Poland, S. P., Gong, Z., Massoubre, D., Valentine, G. J., Gu, E., Dawson, M. D., Richardson, E., Rae, B. R., Blanco-Gomez, G., Cooper, J. M., & Henderson, R. K. (2009). Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. Optics Express, 17(26), 23522-23529. https://doi.org/10.1364/OE.17.023522

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abstract = "We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.",

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doi = "10.1364/OE.17.023522",

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T1 - Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

AU - Elfstrom, D.

AU - Guilhabert, B.J.E.

AU - McKendry, J.

AU - Poland, S.P.

AU - Gong, Z.

AU - Massoubre, D.

AU - Valentine, G.J.

AU - Gu, E.

AU - Dawson, M.D.

AU - Richardson, E.

AU - Rae, B.R.

AU - Blanco-Gomez, G.

AU - Cooper, J.M.

AU - Henderson, R.K.

PY - 2009/12/21

Y1 - 2009/12/21

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AB - We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.

KW - ultraviolet photolithography

KW - micro-pixel

KW - diodes

U2 - 10.1364/OE.17.023522

DO - 10.1364/OE.17.023522

M3 - Article

SN - 1094-4087

VL - 17

SP - 23522

EP - 23529

JO - Optics Express

JF - Optics Express

IS - 26

ER -

Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

Abstract

Keywords

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Semiconductor-Based Hybrid Structures for Ultraviolet Micro-Devices

Cite this