Projects per year
Abstract
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
Original language | English |
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Pages (from-to) | 23522-23529 |
Number of pages | 7 |
Journal | Optics Express |
Volume | 17 |
Issue number | 26 |
DOIs | |
Publication status | Published - 21 Dec 2009 |
Keywords
- ultraviolet photolithography
- micro-pixel
- diodes
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Dive into the research topics of 'Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes'. Together they form a unique fingerprint.Projects
- 1 Finished
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Semiconductor-Based Hybrid Structures for Ultraviolet Micro-Devices
Dawson, M., Calvez, S., Martin, R. & Watson, I.
EPSRC (Engineering and Physical Sciences Research Council)
1/01/07 → 31/12/10
Project: Research