Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfstrom, B.J.E. Guilhabert, J. McKendry, S.P. Poland, Z. Gong, D. Massoubre, G.J. Valentine, E. Gu, M.D. Dawson, E. Richardson, B.R. Rae, G. Blanco-Gomez, J.M. Cooper, R.K. Henderson

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
Original languageEnglish
Pages (from-to)23522-23529
Number of pages7
JournalOptics Express
Volume17
Issue number26
DOIs
Publication statusPublished - 21 Dec 2009

Keywords

  • ultraviolet photolithography
  • micro-pixel
  • diodes

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