Abstract
| Language | English |
|---|---|
| Pages | 23522-23529 |
| Number of pages | 7 |
| Journal | Optics Express |
| Volume | 17 |
| Issue number | 26 |
| DOIs | |
| Publication status | Published - 21 Dec 2009 |
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Keywords
- ultraviolet photolithography
- micro-pixel
- diodes
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Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. / Elfstrom, D.; Guilhabert, B.J.E.; McKendry, J.; Poland, S.P.; Gong, Z.; Massoubre, D.; Valentine, G.J.; Gu, E.; Dawson, M.D.; Richardson, E.; Rae, B.R.; Blanco-Gomez, G.; Cooper, J.M.; Henderson, R.K.
In: Optics Express, Vol. 17, No. 26, 21.12.2009, p. 23522-23529.Research output: Contribution to journal › Article
TY - JOUR
T1 - Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes
AU - Elfstrom, D.
AU - Guilhabert, B.J.E.
AU - McKendry, J.
AU - Poland, S.P.
AU - Gong, Z.
AU - Massoubre, D.
AU - Valentine, G.J.
AU - Gu, E.
AU - Dawson, M.D.
AU - Richardson, E.
AU - Rae, B.R.
AU - Blanco-Gomez, G.
AU - Cooper, J.M.
AU - Henderson, R.K.
PY - 2009/12/21
Y1 - 2009/12/21
N2 - We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
AB - We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
KW - ultraviolet photolithography
KW - micro-pixel
KW - diodes
U2 - 10.1364/OE.17.023522
DO - 10.1364/OE.17.023522
M3 - Article
VL - 17
SP - 23522
EP - 23529
JO - Optics Express
T2 - Optics Express
JF - Optics Express
SN - 1094-4087
IS - 26
ER -