Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfstrom, B.J.E. Guilhabert, J. McKendry, S.P. Poland, Z. Gong, D. Massoubre, G.J. Valentine, E. Gu, M.D. Dawson, E. Richardson, B.R. Rae, G. Blanco-Gomez, J.M. Cooper, R.K. Henderson

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
LanguageEnglish
Pages23522-23529
Number of pages7
JournalOptics Express
Volume17
Issue number26
DOIs
Publication statusPublished - 21 Dec 2009

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photolithography
photoresists
CMOS
light emitting diodes
pixels
gallium nitrides
ultraviolet radiation
microscopes
dosage

Keywords

  • ultraviolet photolithography
  • micro-pixel
  • diodes

Cite this

Elfstrom, D. ; Guilhabert, B.J.E. ; McKendry, J. ; Poland, S.P. ; Gong, Z. ; Massoubre, D. ; Valentine, G.J. ; Gu, E. ; Dawson, M.D. ; Richardson, E. ; Rae, B.R. ; Blanco-Gomez, G. ; Cooper, J.M. ; Henderson, R.K. / Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. In: Optics Express. 2009 ; Vol. 17, No. 26. pp. 23522-23529.
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Elfstrom, D, Guilhabert, BJE, McKendry, J, Poland, SP, Gong, Z, Massoubre, D, Valentine, GJ, Gu, E, Dawson, MD, Richardson, E, Rae, BR, Blanco-Gomez, G, Cooper, JM & Henderson, RK 2009, 'Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes' Optics Express, vol. 17, no. 26, pp. 23522-23529. https://doi.org/10.1364/OE.17.023522

Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. / Elfstrom, D.; Guilhabert, B.J.E.; McKendry, J.; Poland, S.P.; Gong, Z.; Massoubre, D.; Valentine, G.J.; Gu, E.; Dawson, M.D.; Richardson, E.; Rae, B.R.; Blanco-Gomez, G.; Cooper, J.M.; Henderson, R.K.

In: Optics Express, Vol. 17, No. 26, 21.12.2009, p. 23522-23529.

Research output: Contribution to journalArticle

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AU - Elfstrom, D.

AU - Guilhabert, B.J.E.

AU - McKendry, J.

AU - Poland, S.P.

AU - Gong, Z.

AU - Massoubre, D.

AU - Valentine, G.J.

AU - Gu, E.

AU - Dawson, M.D.

AU - Richardson, E.

AU - Rae, B.R.

AU - Blanco-Gomez, G.

AU - Cooper, J.M.

AU - Henderson, R.K.

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