Management of arsenic-rich waste streams in III-V foundries

K. Torrance, H.E. Keenan

Research output: Contribution to journalArticle

Abstract

This article seeks to explain the chemiecal and physical characteristics of hazardous waste, the legislation that covers its safe disposal and to provide some guidance on safe practices for handling waste.
Original languageEnglish
Pages (from-to)66-68
Number of pages2
JournalSemiconductor Today
Volume4
Issue number9
Publication statusPublished - Nov 2009

Fingerprint

iron and steel industry
hazardous waste
legislation
management

Keywords

  • safe practices
  • waste products
  • waste management
  • grinding
  • lapping polishing
  • gallium arsenide
  • water thinning

Cite this

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title = "Management of arsenic-rich waste streams in III-V foundries",
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Management of arsenic-rich waste streams in III-V foundries. / Torrance, K.; Keenan, H.E.

In: Semiconductor Today, Vol. 4, No. 9, 11.2009, p. 66-68.

Research output: Contribution to journalArticle

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KW - lapping polishing

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