Large cross-section edge-coupled diamond waveguides

Yanfeng Zhang; Loyd McKnight; Zhaoshuo Tian; Stephane Calvez; Erdan Gu; Martin D. Dawson

doi:10.1016/j.diamond.2011.03.002

Large cross-section edge-coupled diamond waveguides

Yanfeng Zhang, Loyd McKnight, Zhaoshuo Tian, Stephane Calvez, Erdan Gu, Martin D. Dawson

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	564-567
Number of pages	4
Journal	Diamond and Related Materials
Volume	20
Issue number	4
DOIs	https://doi.org/10.1016/j.diamond.2011.03.002
Publication status	Published - Apr 2011

Keywords

diamond
waveguide
inkjet printing
plasma etching
nanocrystals

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10.1016/j.diamond.2011.03.002

Cite this

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title = "Large cross-section edge-coupled diamond waveguides",

abstract = "A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.",

keywords = "diamond, waveguide, inkjet printing, plasma etching, nanocrystals",

author = "Yanfeng Zhang and Loyd McKnight and Zhaoshuo Tian and Stephane Calvez and Erdan Gu and Dawson, {Martin D.}",

year = "2011",

month = apr,

doi = "10.1016/j.diamond.2011.03.002",

language = "English",

volume = "20",

pages = "564--567",

journal = "Diamond and Related Materials",

issn = "0925-9635",

number = "4",

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TY - JOUR

T1 - Large cross-section edge-coupled diamond waveguides

AU - Zhang, Yanfeng

AU - McKnight, Loyd

AU - Tian, Zhaoshuo

AU - Calvez, Stephane

AU - Gu, Erdan

AU - Dawson, Martin D.

PY - 2011/4

Y1 - 2011/4

N2 - A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.

AB - A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.

KW - diamond

KW - waveguide

KW - inkjet printing

KW - plasma etching

KW - nanocrystals

UR - http://www.scopus.com/inward/record.url?scp=79953249279&partnerID=8YFLogxK

U2 - 10.1016/j.diamond.2011.03.002

DO - 10.1016/j.diamond.2011.03.002

M3 - Article

VL - 20

SP - 564

EP - 567

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

IS - 4

ER -

Large cross-section edge-coupled diamond waveguides

Abstract

Keywords

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Diamond Raman Lasers

MUSIC: MODULAR ULTRAFAST SOURCES

Semiconductor-Based Hybrid Structures for Ultraviolet Micro-Devices

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Large cross-section edge-coupled diamond waveguides

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Projects

Diamond Raman Lasers

MUSIC: MODULAR ULTRAFAST SOURCES

Semiconductor-Based Hybrid Structures for Ultraviolet Micro-Devices

Cite this