Abstract
A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.
| Language | English |
|---|---|
| Pages | 564-567 |
| Number of pages | 4 |
| Journal | Diamond and Related Materials |
| Volume | 20 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - Apr 2011 |
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Keywords
- diamond
- waveguide
- inkjet printing
- plasma etching
- nanocrystals
Cite this
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Large cross-section edge-coupled diamond waveguides. / Zhang, Yanfeng; McKnight, Loyd; Tian, Zhaoshuo; Calvez, Stephane; Gu, Erdan; Dawson, Martin D.
In: Diamond and Related Materials, Vol. 20, No. 4, 04.2011, p. 564-567.Research output: Contribution to journal › Article
TY - JOUR
T1 - Large cross-section edge-coupled diamond waveguides
AU - Zhang, Yanfeng
AU - McKnight, Loyd
AU - Tian, Zhaoshuo
AU - Calvez, Stephane
AU - Gu, Erdan
AU - Dawson, Martin D.
PY - 2011/4
Y1 - 2011/4
N2 - A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.
AB - A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.
KW - diamond
KW - waveguide
KW - inkjet printing
KW - plasma etching
KW - nanocrystals
UR - http://www.scopus.com/inward/record.url?scp=79953249279&partnerID=8YFLogxK
U2 - 10.1016/j.diamond.2011.03.002
DO - 10.1016/j.diamond.2011.03.002
M3 - Article
VL - 20
SP - 564
EP - 567
JO - Diamond and Related Materials
T2 - Diamond and Related Materials
JF - Diamond and Related Materials
SN - 0925-9635
IS - 4
ER -