Large cross-section edge-coupled diamond waveguides

Yanfeng Zhang, Loyd McKnight, Zhaoshuo Tian, Stephane Calvez, Erdan Gu, Martin D. Dawson

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.

LanguageEnglish
Pages564-567
Number of pages4
JournalDiamond and Related Materials
Volume20
Issue number4
DOIs
Publication statusPublished - Apr 2011

Fingerprint

Diamond
Diamonds
Waveguides
diamonds
waveguides
cross sections
Photoresists
photoresists
coffee
Coffee
Guided electromagnetic wave propagation
Plasma etching
Inductively coupled plasma
plasma etching
Substrates
printing
Wave propagation
Printing
wave propagation
Multilayers

Keywords

  • diamond
  • waveguide
  • inkjet printing
  • plasma etching
  • nanocrystals

Cite this

Zhang, Yanfeng ; McKnight, Loyd ; Tian, Zhaoshuo ; Calvez, Stephane ; Gu, Erdan ; Dawson, Martin D. / Large cross-section edge-coupled diamond waveguides. In: Diamond and Related Materials. 2011 ; Vol. 20, No. 4. pp. 564-567.
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Large cross-section edge-coupled diamond waveguides. / Zhang, Yanfeng; McKnight, Loyd; Tian, Zhaoshuo; Calvez, Stephane; Gu, Erdan; Dawson, Martin D.

In: Diamond and Related Materials, Vol. 20, No. 4, 04.2011, p. 564-567.

Research output: Contribution to journalArticle

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