Isophthalic acid: a basis for highly ordered monolayers

Izabela Cebula; Cai Shen; Manfred Buck

doi:10.1002/anie.201002082

Isophthalic acid: a basis for highly ordered monolayers

Izabela Cebula, Cai Shen, Manfred Buck

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

Abstract

Standing on their own two feet: Underpotential deposition of Cu on Au(111) yields a surface onto which 1,3-benzenedicarboxylic acid (IPA) and 1,3,5-benzenetricarboxylic acid (TMA) adsorb in a bipodal configuration. Both molecules form highly crystalline isostructural monolayers, thus demonstrating the potential of the IPA moiety as tecton for self-assembled monolayers. A thin film of a Cu–TMA coordination polymer was grown on a patterned TMA monolayer.

Original language	English
Pages (from-to)	6220-6223
Number of pages	4
Journal	Angewandte Chemie International Edition
Volume	49
Issue number	35
DOIs	https://doi.org/10.1002/anie.201002082
Publication status	Published - 16 Aug 2010
Externally published	Yes

Keywords

coordination chemistry
electrochemistry
self-assembled monolayers
surface chemistry

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10.1002/anie.201002082

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author = "Izabela Cebula and Cai Shen and Manfred Buck",

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AU - Buck, Manfred

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AB - Standing on their own two feet: Underpotential deposition of Cu on Au(111) yields a surface onto which 1,3-benzenedicarboxylic acid (IPA) and 1,3,5-benzenetricarboxylic acid (TMA) adsorb in a bipodal configuration. Both molecules form highly crystalline isostructural monolayers, thus demonstrating the potential of the IPA moiety as tecton for self-assembled monolayers. A thin film of a Cu–TMA coordination polymer was grown on a patterned TMA monolayer.

KW - coordination chemistry

KW - electrochemistry

KW - self-assembled monolayers

KW - surface chemistry

UR - http://onlinelibrary.wiley.com/wol1/doi/10.1002/anie.201002082/abstract

U2 - 10.1002/anie.201002082

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JO - Angewandte Chemie International Edition

JF - Angewandte Chemie International Edition

IS - 35

ER -

Isophthalic acid: a basis for highly ordered monolayers

Abstract

Keywords

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