Isophthalic acid: a basis for highly ordered monolayers

Izabela Cebula, Cai Shen, Manfred Buck

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Standing on their own two feet: Underpotential deposition of Cu on Au(111) yields a surface onto which 1,3-benzenedicarboxylic acid (IPA) and 1,3,5-benzenetricarboxylic acid (TMA) adsorb in a bipodal configuration. Both molecules form highly crystalline isostructural monolayers, thus demonstrating the potential of the IPA moiety as tecton for self-assembled monolayers. A thin film of a Cu–TMA coordination polymer was grown on a patterned TMA monolayer.
LanguageEnglish
Pages6220-6223
Number of pages4
JournalAngewandte Chemie International Edition
Volume49
Issue number35
DOIs
Publication statusPublished - 16 Aug 2010
Externally publishedYes

Fingerprint

Monolayers
Polymers
Acids
Self assembled monolayers
Crystalline materials
Thin films
Molecules
isophthalate
trimesic acid

Keywords

  • coordination chemistry
  • electrochemistry
  • self-assembled monolayers
  • surface chemistry

Cite this

Cebula, Izabela ; Shen, Cai ; Buck, Manfred. / Isophthalic acid : a basis for highly ordered monolayers. In: Angewandte Chemie International Edition . 2010 ; Vol. 49, No. 35. pp. 6220-6223.
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Isophthalic acid : a basis for highly ordered monolayers. / Cebula, Izabela; Shen, Cai; Buck, Manfred.

In: Angewandte Chemie International Edition , Vol. 49, No. 35, 16.08.2010, p. 6220-6223.

Research output: Contribution to journalArticle

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