Improving corrosion resistance of Kovar by subjection to a coupled electromagnetic treatment

Shuai Fu, Yuan Wang, Yi Qin, Liang Huang, Kunlan Huang*, Jie Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

As a common electronic packaging device, Kovar primarily serves to secure, seal, and protect semiconductor chips. The Ni–Au coating applied to its surface effectively resists external corrosion. However, residual stress and defects generated during the electroplating process of the Ni–Au layer often diminish the corrosion resistance of the coating. This study employs a coupled electromagnetic treatment (CEMT) to regulate the Ni–Au coating after electroplating, with the aim of improving their corrosion resistance. The results indicate that the corrosion resistance of the Ni–Au coating was effectively improved after CEMT, and the product qualification rate is 95 %. The residual tensile stress was greatly reduced, the residual tensile stress in the X direction was reduced by 44.84 %, and in the Y direction was reduced by 61.75 %. The nanohardness increased from 0.74 GPa to 0.91 GPa, an increase of 22.97 %. Microstructure analysis showed that the dislocation density of the coating after CEMT was reduced by about 4.2 %, and the dislocation distribution was more uniform. The reduction of stress and the repair of defects provide an important basis for improving the corrosion resistance of the coating.
Original languageEnglish
Article number131123
Number of pages11
JournalMaterials Chemistry and Physics
Volume344
Early online date6 Jun 2025
DOIs
Publication statusE-pub ahead of print - 6 Jun 2025

Funding

The authors wish to acknowledge the financial support by the Aeronautical Science Fund of China (No. 20240042019001).

Keywords

  • coupled electromagnetic treatment
  • Kovar cavity
  • Ni–Au coating
  • corrosion
  • residual tensile stress

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