High temperature annealing and optical activation of Eu implanted GaN

K. Lorenz, U. Wahl, E. Alves, S. Dalmasso, R.W. Martin, K.P. O'Donnell, S. Ruffenach, O. Briot

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Europium was implanted into GaN through a 10 nm thick epitaxially grown AlN layer that protects the GaN surface during the implantation and also serves as a capping layer during the subsequent furnace annealing. Employing this AlN layer prevents the formation of an amorphous surface layer during the implantation. Furthermore, no dissociation of the crystal was observed by Rutherford backscattering and channeling measurements for annealing temperatures up to 1300°C. Remarkably, the intensity of the Eu related luminescence, as measured by cathodoluminescence at room temperature, increases by one order of magnitude within the studied annealing range between 1100 and 1300°C.
Original languageEnglish
Pages (from-to)2712-2714
Number of pages2
JournalApplied Physics Letters
Issue number14
Publication statusPublished - 4 Oct 2005


  • high temperature annealing
  • optical activation
  • Eu implanted GaN
  • nanoscience

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