Abstract
Matrix-addressable arrays of InGaN micro-light-emitting diodes with 128 /spl times/ 96 pixels and a resolution of 1200 dpi have been fabricated using a novel "sloped sidewall" process. The devices have been fabricated on InGaN blue and green wafers, emitting light at the wavelengths of 468 and 508 nm, respectively. A simple circuit, which enables the display of an arrow pattern with /spl sim/60% of the pixels turned on, was used for device testing. At an injection current of 60 mA, the devices deliver 3.3 (blue) and 2.4 mW (green) of output power, corresponding to a luminance of more than 30 000 Cd/m/sup 2/. These high-brightness and highly versatile devices are certainly an attractive form of emissive micro-display.
Original language | English |
---|---|
Pages (from-to) | 277-279 |
Number of pages | 2 |
Journal | IEEE Electron Device Letters |
Volume | 25 |
Issue number | 5 |
DOIs | |
Publication status | Published - 4 May 2004 |
Keywords
- III-V semiconductors
- light emitting diodes
- microdisplays
- semiconductor device manufacture
- semiconductor device testing
- matrix-addressable arrays micro-light-emitting diodes nitride microdisplay sloped sidewall process