Abstract
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applications including mask-free photolithographic exposure. Devices with 64 /spl times/ 64 elements have been fabricated in matrix-addressed format, generating directed output powers of up to 1 /spl mu/W per 20-/spl mu/m-diameter element at less than 1.0-mA drive current. The resistance of each elemental device was found to depend strongly on the n-GaN stripe length. The center wavelength of the emission was measured to be 368 nm, which is very close to that of an i-line (365 nm) UV light source. To our knowledge, this is the first report detailing the fabrication and performance of such devices operating in the UV.
Original language | English |
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Pages (from-to) | 2421-2423 |
Number of pages | 2 |
Journal | IEEE Photonics Technology Letters |
Volume | 16 |
Issue number | 11 |
DOIs | |
Publication status | Published - 18 Oct 2004 |
Keywords
- AlInGaN-based light-emitting diodes
- high-density light-emitting diodes
- i-line UV light source
- light-emitting diode fabrication
- mask-free exposure
- matrix driver circuit
- matrix-addressable light-emitting diodes
- matrix-addressed format
- microarray light-emitting diodes
- photolithographic exposure
- ultraviolet light-emitting diodes