Abstract
In this paper we demonstrate the feasibility of growing III-N semiconductors on novel lattice-matched oxide substrates. Although the growth parameters are not yet optimal, acceptable GaN layers have been grown.
Original language | English |
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Pages (from-to) | 535-539 |
Number of pages | 5 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 395 |
Publication status | Published - 1 Jan 1996 |
Event | Proceedings of the 1995 MRS Fall Meeting - Boston, MA, USA Duration: 26 Nov 1995 → 1 Dec 1995 |