Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

Y. Chen, P.M. Mendes, S. Jacke, K. Critchley, J. Plaza, K. Nikitin, R.E. Palmer, J.A. Preece, S.D. Evans, D. Fitzmaurice

Research output: Contribution to journalArticle

183 Citations (Scopus)

Abstract

This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Original languageEnglish
Pages (from-to)3766-3768
Number of pages2
JournalLangmuir
Volume20
Issue number9
DOIs
Publication statusPublished - 2004

Keywords

  • lithography
  • nanoscience
  • nanoparicles
  • e-beams
  • physics

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