Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

Y. Chen, P.M. Mendes, S. Jacke, K. Critchley, J. Plaza, K. Nikitin, R.E. Palmer, J.A. Preece, S.D. Evans, D. Fitzmaurice

Research output: Contribution to journalArticle

178 Citations (Scopus)

Abstract

This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Original languageEnglish
Pages (from-to)3766-3768
Number of pages2
JournalLangmuir
Volume20
Issue number9
DOIs
Publication statusPublished - 2004

Fingerprint

Silicon wafers
Gold
Lithography
lithography
wafers
gold
Nanoparticles
nanoparticles
silicon
assembly
electron beams
Electron beam lithography
Self assembled monolayers
Silicon
citrates
Optical devices
bioinstrumentation
Biosensors
Citric Acid
Self assembly

Keywords

  • lithography
  • nanoscience
  • nanoparicles
  • e-beams
  • physics

Cite this

Chen, Y., Mendes, P. M., Jacke, S., Critchley, K., Plaza, J., Nikitin, K., ... Fitzmaurice, D. (2004). Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography. Langmuir, 20(9), 3766-3768. https://doi.org/10.1021/la049803g
Chen, Y. ; Mendes, P.M. ; Jacke, S. ; Critchley, K. ; Plaza, J. ; Nikitin, K. ; Palmer, R.E. ; Preece, J.A. ; Evans, S.D. ; Fitzmaurice, D. / Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography. In: Langmuir. 2004 ; Vol. 20, No. 9. pp. 3766-3768.
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abstract = "This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.",
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Chen, Y, Mendes, PM, Jacke, S, Critchley, K, Plaza, J, Nikitin, K, Palmer, RE, Preece, JA, Evans, SD & Fitzmaurice, D 2004, 'Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography', Langmuir, vol. 20, no. 9, pp. 3766-3768. https://doi.org/10.1021/la049803g

Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography. / Chen, Y.; Mendes, P.M.; Jacke, S.; Critchley, K.; Plaza, J.; Nikitin, K.; Palmer, R.E.; Preece, J.A.; Evans, S.D.; Fitzmaurice, D.

In: Langmuir, Vol. 20, No. 9, 2004, p. 3766-3768.

Research output: Contribution to journalArticle

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T1 - Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

AU - Chen, Y.

AU - Mendes, P.M.

AU - Jacke, S.

AU - Critchley, K.

AU - Plaza, J.

AU - Nikitin, K.

AU - Palmer, R.E.

AU - Preece, J.A.

AU - Evans, S.D.

AU - Fitzmaurice, D.

PY - 2004

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N2 - This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.

AB - This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.

KW - lithography

KW - nanoscience

KW - nanoparicles

KW - e-beams

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Chen Y, Mendes PM, Jacke S, Critchley K, Plaza J, Nikitin K et al. Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography. Langmuir. 2004;20(9):3766-3768. https://doi.org/10.1021/la049803g