Fabrication of double split metallic nanorings for raman sensing

A. Cleary, A. Clarke, A. Glidle, J.M. Cooper, D. Cumming

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We describe the fabrication and characterisation of arrays of metallic plasmon resonant nanorings, each of which are formed from two semicircles of different radius. We show that using a dual semicircle structure defined by electron beam lithography can result in closely spaced localized plasmon resonant peaks in the visible region, which cannot be achieved using a simpler nanoring structure with one radius. The advantage of producing two closely spaced resonant peaks is a structure that can be used for Raman sensing purposes at two different wavelengths.
LanguageEnglish
Pages1146-1149
Number of pages3
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
Publication statusPublished - Apr 2009

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Nanorings
Fabrication
fabrication
radii
Electron beam lithography
lithography
electron beams
Wavelength
wavelengths

Keywords

  • localized surface plasmon
  • electron beam lithography
  • metallic plasmon resonant nanorings

Cite this

Cleary, A. ; Clarke, A. ; Glidle, A. ; Cooper, J.M. ; Cumming, D. / Fabrication of double split metallic nanorings for raman sensing. In: Microelectronic Engineering. 2009 ; Vol. 86, No. 4-6. pp. 1146-1149.
@article{e25633d6aa0a40c19dd222165afd49d0,
title = "Fabrication of double split metallic nanorings for raman sensing",
abstract = "We describe the fabrication and characterisation of arrays of metallic plasmon resonant nanorings, each of which are formed from two semicircles of different radius. We show that using a dual semicircle structure defined by electron beam lithography can result in closely spaced localized plasmon resonant peaks in the visible region, which cannot be achieved using a simpler nanoring structure with one radius. The advantage of producing two closely spaced resonant peaks is a structure that can be used for Raman sensing purposes at two different wavelengths.",
keywords = "localized surface plasmon, electron beam lithography, metallic plasmon resonant nanorings",
author = "A. Cleary and A. Clarke and A. Glidle and J.M. Cooper and D. Cumming",
year = "2009",
month = "4",
doi = "10.1016/j.mee.2009.02.008",
language = "English",
volume = "86",
pages = "1146--1149",
journal = "Microelectronic Engineering",
issn = "0167-9317",
number = "4-6",

}

Fabrication of double split metallic nanorings for raman sensing. / Cleary, A.; Clarke, A.; Glidle, A.; Cooper, J.M.; Cumming, D.

In: Microelectronic Engineering, Vol. 86, No. 4-6, 04.2009, p. 1146-1149.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Fabrication of double split metallic nanorings for raman sensing

AU - Cleary, A.

AU - Clarke, A.

AU - Glidle, A.

AU - Cooper, J.M.

AU - Cumming, D.

PY - 2009/4

Y1 - 2009/4

N2 - We describe the fabrication and characterisation of arrays of metallic plasmon resonant nanorings, each of which are formed from two semicircles of different radius. We show that using a dual semicircle structure defined by electron beam lithography can result in closely spaced localized plasmon resonant peaks in the visible region, which cannot be achieved using a simpler nanoring structure with one radius. The advantage of producing two closely spaced resonant peaks is a structure that can be used for Raman sensing purposes at two different wavelengths.

AB - We describe the fabrication and characterisation of arrays of metallic plasmon resonant nanorings, each of which are formed from two semicircles of different radius. We show that using a dual semicircle structure defined by electron beam lithography can result in closely spaced localized plasmon resonant peaks in the visible region, which cannot be achieved using a simpler nanoring structure with one radius. The advantage of producing two closely spaced resonant peaks is a structure that can be used for Raman sensing purposes at two different wavelengths.

KW - localized surface plasmon

KW - electron beam lithography

KW - metallic plasmon resonant nanorings

UR - http://dx.doi.org/10.1016/j.mee.2009.02.008

U2 - 10.1016/j.mee.2009.02.008

DO - 10.1016/j.mee.2009.02.008

M3 - Article

VL - 86

SP - 1146

EP - 1149

JO - Microelectronic Engineering

T2 - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 4-6

ER -