Fabrication and characteristics of flexible normally-off AlGaN/GaN HEMTs

Runze Lin, Desheng Zhao, Guohao Yu, Xiaoyan Liu, Dongdong Wu, Erdan Gu, Xugao Cui, Ran Liu, Baoshun Zhang, Pengfei Tian

Research output: Contribution to journalArticle

Abstract

In this paper, we present a method for removing a high electron mobility transistor (HEMT) silicon substrate using mechanical grinding and deep silicon etching technology and successfully transferred the epitaxial wafer to a PET substrate to achieve the flexible normally-off HEMT. By testing the output characteristics and transfer characteristics of the Si-substrate HEMT and PET-substrate HEMT, we have demonstrated that the PET-substrate HEMT has excellent performance and successfully achieved the mechanical flexibility. Furthermore, we analyzed the physical mechanisms of the change in PET-substrate and Si-substrate HEMT characteristics, as well as flexible HEMT performance under bent and flattened states. The flexible HEMT array demonstrates significant potential in integration with other flexible devices, such as GaN-based micro-LED arrays.

Original languageEnglish
Article number105317
Number of pages6
JournalAIP Advances
Volume10
Issue number10
DOIs
Publication statusPublished - 8 Oct 2020

Keywords

  • high electron mobility transistor (HEMT)
  • mechanical grinding
  • deep silicon etching

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