Evidence of high-n hollow ion emission from Si ions pumped by ultraintense x-rays from relativistic laser plasma

We report on the first observation of high-n hollow ions (ions having no electrons in the K or L shells) produced in Si targets via pumping by ultra-intense x-ray radiation produced in intense laser-plasma interactions reaching the radiation dominant kinetics regime. The existence of these new types of hollow ions in high energy density plasma has been found via observation of highly-resolved x-ray emission spectra of silicon plasma, and confirmed by plasma kinetics calculations, underscoring the ability of powerful radiation sources to fully strip electrons from the inner-most shells of light atoms. Hollow ions spectral diagnostics provide a unique opportunity to characterize powerful x-ray radiation of laboratory and astrophysical plasmas.