Evidence for H2* trapped by carbon impurities in silicon

B. Hourahine, R. Jones, S. Öberg, P.R. Briddon, V.P. Markevich, R.C. Newman, J. Hermansson, M. Kleverman, J.L. Lindstrom, L.I. Murin, N. Fukatah, M. Suezawa

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)

Abstract

Local mode spectroscopy and ab initio modelling are used to investigate two trigonal defects found in carbon-rich Si into which H had been in-diffused. Isotopic shifts with D and 13C are reported along with the effect of uniaxial stress. Ab initio modelling studies suggest that the two defects are two forms of the CH2* complex where one of the two hydrogen atoms lies at an anti-bonding site attached to C or Si, respectively. The two structures are nearly degenerate and possess vibrational modes in good agreement with those observed.
Original languageEnglish
Pages (from-to)197-201
Number of pages5
JournalPhysica B: Condensed Matter
Volume308-310
DOIs
Publication statusPublished - Dec 2001

Keywords

  • silicon
  • hydrogen
  • carbon
  • impurity complexes
  • absorption bands
  • nanoscience

Fingerprint

Dive into the research topics of 'Evidence for H2* trapped by carbon impurities in silicon'. Together they form a unique fingerprint.

Cite this