Evaluation of the thermodynamic data of CH3SiCI3 based on quantum chemistry calculations

Q.F. Zeng, L.T. Zhang, Y.D. Xu, L.F. Cheng, X.T. Yan

Research output: Contribution to journalArticle

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Abstract

CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing both an oxidation resistant SiC coating and a functional SiC film by chemical vapor deposition (CVD). In order to analyze the decomposition products of MTS with a thermodynamic calculation, correct thermodynamic data must be obtained from the authoritative data sources. G3(MP2) has been applied to evaluate the thermodynamic data of MTS(gas). The calculated value of the Gibbs energy of formation, -fGm0(298.15 K)=-490.13 kJ.mol-1, compares with a value, -fGm0(298.15 K)=-468.02 kJ.mol-1 from the 4th edition of the NIST-JANAF Thermochemical Tables. Further analyses have been conducted: (1) by using G3, G3//B3LYP, and G3(MP2)//B3LYP theories; (2) by using variable scale factors for G3(MP2) theory; and (3) by investigating the accuracy of both experimental and calculated thermodynamic data. The calculated values can provide -fGm0 values for MTS above 1500 K. The final fitted equation for MTS(gas) is: -fGm0=7.5763×10-6T2+1.9649×10-1T-5.4817×102, where T is absolute temperature.
LanguageEnglish
Pages1385-1390
Number of pages5
JournalJournal of Physical and Chemical Reference Data
Volume35
Issue number3
DOIs
Publication statusPublished - 2006

Fingerprint

Quantum chemistry
quantum chemistry
Thermodynamics
thermodynamics
evaluation
Gases
energy of formation
gases
Gibbs free energy
manufacturing
vapor deposition
Chemical vapor deposition
coatings
decomposition
oxidation
methyltrichlorosilane
Decomposition
products
Coatings
Oxidation

Keywords

  • organic compounds
  • dissociation
  • reaction kinetics theory
  • perturbation theory
  • density functional theory
  • heat of formation

Cite this

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title = "Evaluation of the thermodynamic data of CH3SiCI3 based on quantum chemistry calculations",
abstract = "CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing both an oxidation resistant SiC coating and a functional SiC film by chemical vapor deposition (CVD). In order to analyze the decomposition products of MTS with a thermodynamic calculation, correct thermodynamic data must be obtained from the authoritative data sources. G3(MP2) has been applied to evaluate the thermodynamic data of MTS(gas). The calculated value of the Gibbs energy of formation, -fGm0(298.15 K)=-490.13 kJ.mol-1, compares with a value, -fGm0(298.15 K)=-468.02 kJ.mol-1 from the 4th edition of the NIST-JANAF Thermochemical Tables. Further analyses have been conducted: (1) by using G3, G3//B3LYP, and G3(MP2)//B3LYP theories; (2) by using variable scale factors for G3(MP2) theory; and (3) by investigating the accuracy of both experimental and calculated thermodynamic data. The calculated values can provide -fGm0 values for MTS above 1500 K. The final fitted equation for MTS(gas) is: -fGm0=7.5763×10-6T2+1.9649×10-1T-5.4817×102, where T is absolute temperature.",
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author = "Q.F. Zeng and L.T. Zhang and Y.D. Xu and L.F. Cheng and X.T. Yan",
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Evaluation of the thermodynamic data of CH3SiCI3 based on quantum chemistry calculations. / Zeng, Q.F.; Zhang, L.T.; Xu, Y.D.; Cheng, L.F.; Yan, X.T.

In: Journal of Physical and Chemical Reference Data, Vol. 35, No. 3, 2006, p. 1385-1390.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Evaluation of the thermodynamic data of CH3SiCI3 based on quantum chemistry calculations

AU - Zeng, Q.F.

AU - Zhang, L.T.

AU - Xu, Y.D.

AU - Cheng, L.F.

AU - Yan, X.T.

PY - 2006

Y1 - 2006

N2 - CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing both an oxidation resistant SiC coating and a functional SiC film by chemical vapor deposition (CVD). In order to analyze the decomposition products of MTS with a thermodynamic calculation, correct thermodynamic data must be obtained from the authoritative data sources. G3(MP2) has been applied to evaluate the thermodynamic data of MTS(gas). The calculated value of the Gibbs energy of formation, -fGm0(298.15 K)=-490.13 kJ.mol-1, compares with a value, -fGm0(298.15 K)=-468.02 kJ.mol-1 from the 4th edition of the NIST-JANAF Thermochemical Tables. Further analyses have been conducted: (1) by using G3, G3//B3LYP, and G3(MP2)//B3LYP theories; (2) by using variable scale factors for G3(MP2) theory; and (3) by investigating the accuracy of both experimental and calculated thermodynamic data. The calculated values can provide -fGm0 values for MTS above 1500 K. The final fitted equation for MTS(gas) is: -fGm0=7.5763×10-6T2+1.9649×10-1T-5.4817×102, where T is absolute temperature.

AB - CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing both an oxidation resistant SiC coating and a functional SiC film by chemical vapor deposition (CVD). In order to analyze the decomposition products of MTS with a thermodynamic calculation, correct thermodynamic data must be obtained from the authoritative data sources. G3(MP2) has been applied to evaluate the thermodynamic data of MTS(gas). The calculated value of the Gibbs energy of formation, -fGm0(298.15 K)=-490.13 kJ.mol-1, compares with a value, -fGm0(298.15 K)=-468.02 kJ.mol-1 from the 4th edition of the NIST-JANAF Thermochemical Tables. Further analyses have been conducted: (1) by using G3, G3//B3LYP, and G3(MP2)//B3LYP theories; (2) by using variable scale factors for G3(MP2) theory; and (3) by investigating the accuracy of both experimental and calculated thermodynamic data. The calculated values can provide -fGm0 values for MTS above 1500 K. The final fitted equation for MTS(gas) is: -fGm0=7.5763×10-6T2+1.9649×10-1T-5.4817×102, where T is absolute temperature.

KW - organic compounds

KW - dissociation

KW - reaction kinetics theory

KW - perturbation theory

KW - density functional theory

KW - heat of formation

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