Electrophotographically patterned thin-film silicon transistors

H. Gleskova, R. Könenkamp, S. Wagner, D. S. Shen

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

The authors made amorphous silicon thin-film transistors on glass foil using exclusively electrophotographic printing for pattern formation, contact hole opening, and device isolation. Toner masks were applied by feeding the glass substrate through a photocopier, or from laser-printed patterns on transfer paper. This all-printed patterning is an important step toward demonstrating a low-cost large-area circuit processing technology.

Original languageEnglish
Pages (from-to)264-266
Number of pages3
JournalIEEE Electron Device Letters
Volume17
Issue number6
DOIs
Publication statusPublished - 1996

Keywords

  • thin-film silicon transistors
  • silicon transistors
  • electrophotographic printing

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