Electrodeposition of microstructures using a patterned anode

Qi-Bai Wu, T. A. Green, S. Roy

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)
132 Downloads (Pure)


In this paper we report the transfer of micro-scale patterns by electrodeposition on to substrates without requiring them to be coated with a photoresist mask. This approach makes uses of a patterned tool which is placed in close proximity to the substrate in an electrochemical reactor. With an appropriate choice of electrochemical parameters, electrodeposition can be confined to regions corresponding to the exposed regions of the tool. Experiments indicate that the electrodeposition of copper features on to conductive substrates is possible using this approach. Copper lines of 100 μm width have been successfully replicated, but with some increase in dimension due to current spreading. This effect can be minimised by reducing the inter-electrode gap and employing an electrolyte with a low conductivity. It is also demonstrated that the tool can be used to pattern multiple substrates.

Original languageEnglish
Pages (from-to)1229-1232
Number of pages4
JournalElectrochemistry Communications
Issue number11
Early online date31 Aug 2011
Publication statusPublished - 30 Nov 2011


  • copper
  • electrodeposition
  • etching
  • microfabrication
  • micro-scale patterns
  • pattern transfer
  • EnFACE
  • electrochemical parameters


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