Abstract
A method for the electrodeposition of compositionally modulated alloys by a electrodeposition-displacement reaction scheme from a single electrolyte using pulsed currents is presented. The less noble material is deposited by applying a high cathodic current pulse. The more noble component is plated by a displacement reaction between the more noble and the less noble components when the current is switched off. Theoretical equations to calculate the composition of the modulated layers are discussed. Experimentally, modulated alloys of copper and nickel have been plated to illustrate the applicability of this scheme.
| Original language | English |
|---|---|
| Pages (from-to) | 202-205 |
| Number of pages | 4 |
| Journal | Surface and Coatings Technology |
| Volume | 105 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 25 Jun 1998 |
Keywords
- Alloys
- Compositionally modulated alloys
- Electrodeposition
- Metal multilayers
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