Electrical stability of a-Si:H TFTs fabricated at 150ºC

Helena Gleskova; S. Wagner

Electrical stability of a-Si:H TFTs fabricated at 150ºC

Helena Gleskova, S. Wagner

Electronic And Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution book

Abstract

This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC

Original language	English
Title of host publication	Amorphous and heterogeneous silicon-based films – 2001
Subtitle of host publication	volume 664 - MRS proceedings
Editors	M. Stutzmann, J. B. Boyce, J. D. Cohen, R. W. Collins, J. Hanna
Place of Publication	Warrendale, PA
Pages	A19.7.1-A19.7.6
Number of pages	6
Volume	664
Publication status	Published - 15 Oct 2001
Event	MRS Spring Meeting 2001 - San Francisco, United States Duration: 16 Apr 2001 → 20 Apr 2001

Publication series

Name	MRS Symposium Proceedings
Publisher	Materials Research Society
Volume	664

Conference

Conference	MRS Spring Meeting 2001
Country/Territory	United States
City	San Francisco
Period	16/04/01 → 20/04/01

Keywords

electrical stability
si:h tft
fabricated
150-degrees-C

Cite this

@inproceedings{917aaf278095410984a5b7c4d14e1f22,

title = "Electrical stability of a-Si:H TFTs fabricated at 150ºC",

abstract = "This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC",

keywords = "electrical stability, si:h tft , fabricated, 150-degrees-C",

author = "Helena Gleskova and S. Wagner",

year = "2001",

month = oct,

day = "15",

language = "English",

isbn = "9781558996007",

volume = "664",

series = "MRS Symposium Proceedings",

publisher = "Materials Research Society",

pages = "A19.7.1--A19.7.6",

editor = "M. Stutzmann and Boyce, {J. B.} and Cohen, {J. D.} and Collins, {R. W.} and J. Hanna",

booktitle = "Amorphous and heterogeneous silicon-based films – 2001",

note = "MRS Spring Meeting 2001 ; Conference date: 16-04-2001 Through 20-04-2001",

}

Gleskova, H & Wagner, S 2001, Electrical stability of a-Si:H TFTs fabricated at 150ºC. in M Stutzmann, JB Boyce, JD Cohen, RW Collins & J Hanna (eds), Amorphous and heterogeneous silicon-based films – 2001: volume 664 - MRS proceedings. vol. 664, MRS Symposium Proceedings, vol. 664, Warrendale, PA, pp. A19.7.1-A19.7.6, MRS Spring Meeting 2001, San Francisco, United States, 16/04/01.

Electrical stability of a-Si:H TFTs fabricated at 150ºC. / Gleskova, Helena; Wagner, S.
Amorphous and heterogeneous silicon-based films – 2001: volume 664 - MRS proceedings. ed. / M. Stutzmann; J. B. Boyce; J. D. Cohen; R. W. Collins; J. Hanna. Vol. 664 Warrendale, PA, 2001. p. A19.7.1-A19.7.6 (MRS Symposium Proceedings; Vol. 664).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution book

TY - GEN

T1 - Electrical stability of a-Si:H TFTs fabricated at 150ºC

AU - Gleskova, Helena

AU - Wagner, S.

PY - 2001/10/15

Y1 - 2001/10/15

N2 - This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC

AB - This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC

KW - electrical stability

KW - si:h tft

KW - fabricated

KW - 150-degrees-C

M3 - Conference contribution book

SN - 9781558996007

VL - 664

T3 - MRS Symposium Proceedings

SP - A19.7.1-A19.7.6

BT - Amorphous and heterogeneous silicon-based films – 2001

A2 - Stutzmann, M.

A2 - Boyce, J. B.

A2 - Cohen, J. D.

A2 - Collins, R. W.

A2 - Hanna, J.

CY - Warrendale, PA

T2 - MRS Spring Meeting 2001

Y2 - 16 April 2001 through 20 April 2001

ER -