Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Jie Xie, H. Yin, L. Zhang, Kevin Ronald, A.D.R. Phelps, W. He, G. Shu, J. Zhao, X. Chen, Y. Alfadhl, J. Zhang, A.W. Cross

Research output: Contribution to conferencePaperpeer-review

4 Downloads (Pure)


A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).
Original languageEnglish
Number of pages3
Publication statusPublished - 20 Aug 2019
Event12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019) - Queen Mary University of London, London, United Kingdom
Duration: 20 Aug 201922 Aug 2019


Conference12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019)
Abbreviated titleUCMMT 2019
CountryUnited Kingdom
Internet address


  • extended interaction oscillator
  • pseudospark discharge
  • sheet electron beam
  • sub-terahertz

Cite this