Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Jie Xie; H. Yin; L. Zhang; Kevin Ronald; A.D.R. Phelps; W. He; G. Shu; J. Zhao; X. Chen; Y. Alfadhl; J. Zhang; A.W. Cross

Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Jie Xie, H. Yin, L. Zhang, Kevin Ronald, A.D.R. Phelps, W. He, G. Shu, J. Zhao, X. Chen, Y. Alfadhl, J. Zhang, A.W. Cross

Research output: Contribution to conference › Paper › peer-review

32 Downloads (Pure)

Abstract

A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

Original language	English
Number of pages	3
Publication status	Published - 20 Aug 2019
Event	12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019) - Queen Mary University of London, London, United Kingdom Duration: 20 Aug 2019 → 22 Aug 2019 http://www.ucmmt2019.com

Conference

Conference	12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019)
Abbreviated title	UCMMT 2019
Country/Territory	United Kingdom
City	London
Period	20/08/19 → 22/08/19
Internet address	http://www.ucmmt2019.com

Keywords

extended interaction oscillator
pseudospark discharge
sheet electron beam
sub-terahertz

Access to Document

Xie-etal-UCMMT-2019-Effects-of-tolerance-fabrication-of-extended-interaction-oscillatorAccepted author manuscript, 321 KB

Cite this

Xie, J., Yin, H., Zhang, L., Ronald, K., Phelps, A. D. R., He, W., Shu, G., Zhao, J., Chen, X., Alfadhl, Y., Zhang, J., & Cross, A. W. (2019). Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.

@conference{289535fcb44e4a0c817c126d3d375afc,

title = "Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz",

abstract = "A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).",

keywords = "extended interaction oscillator, pseudospark discharge, sheet electron beam, sub-terahertz",

author = "Jie Xie and H. Yin and L. Zhang and Kevin Ronald and A.D.R. Phelps and W. He and G. Shu and J. Zhao and X. Chen and Y. Alfadhl and J. Zhang and A.W. Cross",

year = "2019",

month = aug,

day = "20",

language = "English",

note = "12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), UCMMT 2019 ; Conference date: 20-08-2019 Through 22-08-2019",

url = "http://www.ucmmt2019.com",

}

Xie, J, Yin, H, Zhang, L , Ronald, K , Phelps, ADR, He, W, Shu, G, Zhao, J, Chen, X, Alfadhl, Y, Zhang, J & Cross, AW 2019, 'Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz', Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom, 20/08/19 - 22/08/19.

Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. / Xie, Jie; Yin, H.; Zhang, L. et al.
2019. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.

Research output: Contribution to conference › Paper › peer-review

TY - CONF

T1 - Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

AU - Xie, Jie

AU - Yin, H.

AU - Zhang, L.

AU - Ronald, Kevin

AU - Phelps, A.D.R.

AU - He, W.

AU - Shu, G.

AU - Zhao, J.

AU - Chen, X.

AU - Alfadhl, Y.

AU - Zhang, J.

AU - Cross, A.W.

PY - 2019/8/20

Y1 - 2019/8/20

N2 - A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

AB - A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

KW - extended interaction oscillator

KW - pseudospark discharge

KW - sheet electron beam

KW - sub-terahertz

UR - http://imws2014.eecs.qmul.ac.uk/

M3 - Paper

T2 - 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019)

Y2 - 20 August 2019 through 22 August 2019

ER -

Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Abstract

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Cite this