Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Jie Xie, H. Yin, L. Zhang, Kevin Ronald, A.D.R. Phelps, W. He, G. Shu, J. Zhao, X. Chen, Y. Alfadhl, J. Zhang, A.W. Cross

Research output: Contribution to conferencePaper

Abstract

A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

Conference

Conference12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019)
Abbreviated titleUCMMT 2019
CountryUnited Kingdom
CityLondon
Period20/08/1922/08/19
Internet address

Fingerprint

oscillators
electron beams
machining
fabrication
interactions
surface roughness
roughness
manufacturing
high speed
etching
wire
impedance
costs
conductivity
ions

Keywords

  • extended interaction oscillator
  • pseudospark discharge
  • sheet electron beam
  • sub-terahertz

Cite this

Xie, J., Yin, H., Zhang, L., Ronald, K., Phelps, A. D. R., He, W., ... Cross, A. W. (2019). Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.
Xie, Jie ; Yin, H. ; Zhang, L. ; Ronald, Kevin ; Phelps, A.D.R. ; He, W. ; Shu, G. ; Zhao, J. ; Chen, X. ; Alfadhl, Y. ; Zhang, J. ; Cross, A.W. / Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.3 p.
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title = "Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz",
abstract = "A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).",
keywords = "extended interaction oscillator, pseudospark discharge, sheet electron beam, sub-terahertz",
author = "Jie Xie and H. Yin and L. Zhang and Kevin Ronald and A.D.R. Phelps and W. He and G. Shu and J. Zhao and X. Chen and Y. Alfadhl and J. Zhang and A.W. Cross",
year = "2019",
month = "8",
day = "20",
language = "English",
note = "12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), UCMMT 2019 ; Conference date: 20-08-2019 Through 22-08-2019",
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}

Xie, J, Yin, H, Zhang, L, Ronald, K, Phelps, ADR, He, W, Shu, G, Zhao, J, Chen, X, Alfadhl, Y, Zhang, J & Cross, AW 2019, 'Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz' Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom, 20/08/19 - 22/08/19, .

Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. / Xie, Jie; Yin, H.; Zhang, L.; Ronald, Kevin; Phelps, A.D.R.; He, W.; Shu, G.; Zhao, J.; Chen, X.; Alfadhl, Y.; Zhang, J.; Cross, A.W.

2019. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.

Research output: Contribution to conferencePaper

TY - CONF

T1 - Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

AU - Xie, Jie

AU - Yin, H.

AU - Zhang, L.

AU - Ronald, Kevin

AU - Phelps, A.D.R.

AU - He, W.

AU - Shu, G.

AU - Zhao, J.

AU - Chen, X.

AU - Alfadhl, Y.

AU - Zhang, J.

AU - Cross, A.W.

PY - 2019/8/20

Y1 - 2019/8/20

N2 - A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

AB - A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).

KW - extended interaction oscillator

KW - pseudospark discharge

KW - sheet electron beam

KW - sub-terahertz

UR - http://imws2014.eecs.qmul.ac.uk/

M3 - Paper

ER -

Xie J, Yin H, Zhang L, Ronald K, Phelps ADR, He W et al. Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. 2019. Paper presented at 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), London, United Kingdom.