Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films

A. A. Sugumaran, Y. Purandare, P. Mandal, A.P. Ehiasarian, I. Khan, P.Eh. Hovsepian

Research output: Contribution to conferencePaper

Abstract

TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition. Four source combinations were used namely 4UBM (pure UBM), 1HIPIMS+3UBM, 2HIPIMS+2UBM and 2 HIPIMS (pure HIPIMS) for the deposition. Optical emission spectroscopy (OES) measurements revealed that the degree of Ti ion flux increased with increasing number of HIPIMS sources involved in the process. The microstructural characterisation was done by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The potenitiodynamic polarization measurements showed that the pure HIPIMS and 2HIPIMS+2UBM exhibited better corrosion resistance compared to 1HIPIMS+3UBM and pure UBM coatings. The positive shift of Ecorr value from -391 mV for pure UBM coating to +305 mV for 2HIPIMS+2UBM coating was observed. The SEM investigations of corroded samples revealed that the pure UBM coating exhibited more number of corrosion pits which is a clear sign of aggressive corrosion than the other three coatings. Raman analysis showed that pure UBM and 1HIPIMS+3UBM coating corroded more and allowed the electrolyte to react with the substrate as oxides due to substrate contribution can be seen on the surface. Moreover 2HIPIMS+2UBM and pure HIPIMS coating surfaces were free from these oxides due to highly dense microstructure. The cross section TEM analysis exhibited the void free high density coating with weak column boundaries deposited by pure HIPIMS sources.

Conference

Conference56th Annual Technical Conference of the Society of Vacuum Coaters
Abbreviated titleSVC TECHCON 2013
CountryUnited States
CityProvidence, RI
Period20/04/1325/04/13

Fingerprint

Tin
Magnetron sputtering
Corrosion
Coatings
Oxides
Transmission electron microscopy
Optical emission spectroscopy
Scanning electron microscopy
Substrates
Electrolytes
Corrosion resistance
Cathodes
Ions
Polarization
Fluxes
Microstructure

Keywords

  • TiN coatings
  • unbalanced magnetron
  • high power impulse magnetron sputtering
  • optical emission spectroscopy
  • corrosion resistance
  • metal nitride coatings
  • corrosion resistant thin films

Cite this

Sugumaran, A. A., Purandare, Y., Mandal, P., Ehiasarian, A. P., Khan, I., & Hovsepian, P. E. (2013). Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films. 423-432. Paper presented at 56th Annual Technical Conference of the Society of Vacuum Coaters, Providence, RI, United States. https://doi.org/10.14332/svc13.proc.1039
Sugumaran, A. A. ; Purandare, Y. ; Mandal, P. ; Ehiasarian, A.P. ; Khan, I. ; Hovsepian, P.Eh. / Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films. Paper presented at 56th Annual Technical Conference of the Society of Vacuum Coaters, Providence, RI, United States.10 p.
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title = "Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films",
abstract = "TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition. Four source combinations were used namely 4UBM (pure UBM), 1HIPIMS+3UBM, 2HIPIMS+2UBM and 2 HIPIMS (pure HIPIMS) for the deposition. Optical emission spectroscopy (OES) measurements revealed that the degree of Ti ion flux increased with increasing number of HIPIMS sources involved in the process. The microstructural characterisation was done by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The potenitiodynamic polarization measurements showed that the pure HIPIMS and 2HIPIMS+2UBM exhibited better corrosion resistance compared to 1HIPIMS+3UBM and pure UBM coatings. The positive shift of Ecorr value from -391 mV for pure UBM coating to +305 mV for 2HIPIMS+2UBM coating was observed. The SEM investigations of corroded samples revealed that the pure UBM coating exhibited more number of corrosion pits which is a clear sign of aggressive corrosion than the other three coatings. Raman analysis showed that pure UBM and 1HIPIMS+3UBM coating corroded more and allowed the electrolyte to react with the substrate as oxides due to substrate contribution can be seen on the surface. Moreover 2HIPIMS+2UBM and pure HIPIMS coating surfaces were free from these oxides due to highly dense microstructure. The cross section TEM analysis exhibited the void free high density coating with weak column boundaries deposited by pure HIPIMS sources.",
keywords = "TiN coatings, unbalanced magnetron, high power impulse magnetron sputtering, optical emission spectroscopy, corrosion resistance, metal nitride coatings, corrosion resistant thin films",
author = "Sugumaran, {A. A.} and Y. Purandare and P. Mandal and A.P. Ehiasarian and I. Khan and P.Eh. Hovsepian",
year = "2013",
month = "8",
day = "18",
doi = "10.14332/svc13.proc.1039",
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note = "56th Annual Technical Conference of the Society of Vacuum Coaters, SVC TECHCON 2013 ; Conference date: 20-04-2013 Through 25-04-2013",

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Sugumaran, AA, Purandare, Y, Mandal, P, Ehiasarian, AP, Khan, I & Hovsepian, PE 2013, 'Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films' Paper presented at 56th Annual Technical Conference of the Society of Vacuum Coaters, Providence, RI, United States, 20/04/13 - 25/04/13, pp. 423-432. https://doi.org/10.14332/svc13.proc.1039

Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films. / Sugumaran, A. A.; Purandare, Y.; Mandal, P.; Ehiasarian, A.P. ; Khan, I.; Hovsepian, P.Eh.

2013. 423-432 Paper presented at 56th Annual Technical Conference of the Society of Vacuum Coaters, Providence, RI, United States.

Research output: Contribution to conferencePaper

TY - CONF

T1 - Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films

AU - Sugumaran, A. A.

AU - Purandare, Y.

AU - Mandal, P.

AU - Ehiasarian, A.P.

AU - Khan, I.

AU - Hovsepian, P.Eh.

PY - 2013/8/18

Y1 - 2013/8/18

N2 - TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition. Four source combinations were used namely 4UBM (pure UBM), 1HIPIMS+3UBM, 2HIPIMS+2UBM and 2 HIPIMS (pure HIPIMS) for the deposition. Optical emission spectroscopy (OES) measurements revealed that the degree of Ti ion flux increased with increasing number of HIPIMS sources involved in the process. The microstructural characterisation was done by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The potenitiodynamic polarization measurements showed that the pure HIPIMS and 2HIPIMS+2UBM exhibited better corrosion resistance compared to 1HIPIMS+3UBM and pure UBM coatings. The positive shift of Ecorr value from -391 mV for pure UBM coating to +305 mV for 2HIPIMS+2UBM coating was observed. The SEM investigations of corroded samples revealed that the pure UBM coating exhibited more number of corrosion pits which is a clear sign of aggressive corrosion than the other three coatings. Raman analysis showed that pure UBM and 1HIPIMS+3UBM coating corroded more and allowed the electrolyte to react with the substrate as oxides due to substrate contribution can be seen on the surface. Moreover 2HIPIMS+2UBM and pure HIPIMS coating surfaces were free from these oxides due to highly dense microstructure. The cross section TEM analysis exhibited the void free high density coating with weak column boundaries deposited by pure HIPIMS sources.

AB - TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition. Four source combinations were used namely 4UBM (pure UBM), 1HIPIMS+3UBM, 2HIPIMS+2UBM and 2 HIPIMS (pure HIPIMS) for the deposition. Optical emission spectroscopy (OES) measurements revealed that the degree of Ti ion flux increased with increasing number of HIPIMS sources involved in the process. The microstructural characterisation was done by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The potenitiodynamic polarization measurements showed that the pure HIPIMS and 2HIPIMS+2UBM exhibited better corrosion resistance compared to 1HIPIMS+3UBM and pure UBM coatings. The positive shift of Ecorr value from -391 mV for pure UBM coating to +305 mV for 2HIPIMS+2UBM coating was observed. The SEM investigations of corroded samples revealed that the pure UBM coating exhibited more number of corrosion pits which is a clear sign of aggressive corrosion than the other three coatings. Raman analysis showed that pure UBM and 1HIPIMS+3UBM coating corroded more and allowed the electrolyte to react with the substrate as oxides due to substrate contribution can be seen on the surface. Moreover 2HIPIMS+2UBM and pure HIPIMS coating surfaces were free from these oxides due to highly dense microstructure. The cross section TEM analysis exhibited the void free high density coating with weak column boundaries deposited by pure HIPIMS sources.

KW - TiN coatings

KW - unbalanced magnetron

KW - high power impulse magnetron sputtering

KW - optical emission spectroscopy

KW - corrosion resistance

KW - metal nitride coatings

KW - corrosion resistant thin films

U2 - 10.14332/svc13.proc.1039

DO - 10.14332/svc13.proc.1039

M3 - Paper

SP - 423

EP - 432

ER -

Sugumaran AA, Purandare Y, Mandal P, Ehiasarian AP, Khan I, Hovsepian PE. Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of tin films. 2013. Paper presented at 56th Annual Technical Conference of the Society of Vacuum Coaters, Providence, RI, United States. https://doi.org/10.14332/svc13.proc.1039