Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Alexander J. C. Kuehne; David Elfstrom; Allan R. Mackintosh; Alexander L. Kanibolotsky; Benoit Guilhabert; Erdan Gu; Igor F. Perepichka; Peter J. Skabara; Martin D. Dawson; Richard A. Pethrick

doi:10.1002/adma.200802656

Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Alexander J. C. Kuehne
, David Elfstrom
, Allan R. Mackintosh
, Alexander L. Kanibolotsky
, Benoit Guilhabert
, Erdan Gu
, Igor F. Perepichka
, Peter J. Skabara
, Martin D. Dawson
, Richard A. Pethrick

Research output: Contribution to journal › Article › peer-review

32 Citations (Scopus)

Abstract

Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

Original language	English
Pages (from-to)	781–785
Number of pages	5
Journal	Advanced Materials
Volume	21
Issue number	7
DOIs	https://doi.org/10.1002/adma.200802656
Publication status	Published - 16 Feb 2009

Keywords

photoresist microstructures
oligofluorene truxenes
vinyl ether photoresist

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10.1002/adma.200802656

Physical Organic Chemistry: Opportunities In Synthesis, Materials And Pharmaceuticals (Science And Innovation Award)
Murphy, J. (Principal Investigator), Coombs, G. (Co-investigator), Ferguson, A. (Co-investigator) & Florence, A. (Co-investigator)
Scottish Funding Council SFC, EPSRC (Engineering and Physical Sciences Research Council)
1/09/07 → 30/10/12
Project: Research

Cite this

@article{696b154bceef41b9ba30a37ba354cbef,

title = "Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures",

abstract = "Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.",

keywords = "photoresist microstructures , oligofluorene truxenes, vinyl ether photoresist",

author = "Kuehne, \{Alexander J. C.\} and David Elfstrom and Mackintosh, \{Allan R.\} and Kanibolotsky, \{Alexander L.\} and Benoit Guilhabert and Erdan Gu and Perepichka, \{Igor F.\} and Skabara, \{Peter J.\} and Dawson, \{Martin D.\} and Pethrick, \{Richard A.\}",

year = "2009",

month = feb,

day = "16",

doi = "10.1002/adma.200802656",

language = "English",

volume = "21",

pages = "781–785",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "7",

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TY - JOUR

T1 - Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

AU - Kuehne, Alexander J. C.

AU - Elfstrom, David

AU - Mackintosh, Allan R.

AU - Kanibolotsky, Alexander L.

AU - Guilhabert, Benoit

AU - Gu, Erdan

AU - Perepichka, Igor F.

AU - Skabara, Peter J.

AU - Dawson, Martin D.

AU - Pethrick, Richard A.

PY - 2009/2/16

Y1 - 2009/2/16

N2 - Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

AB - Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

KW - photoresist microstructures

KW - oligofluorene truxenes

KW - vinyl ether photoresist

U2 - 10.1002/adma.200802656

DO - 10.1002/adma.200802656

M3 - Article

SN - 0935-9648

VL - 21

SP - 781

EP - 785

JO - Advanced Materials

JF - Advanced Materials

IS - 7

ER -

Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Abstract

Keywords

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Projects

Physical Organic Chemistry: Opportunities In Synthesis, Materials And Pharmaceuticals (Science And Innovation Award)

Cite this