Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Alexander J. C. Kuehne, David Elfstrom, Allan R. Mackintosh, Alexander L. Kanibolotsky, Benoit Guilhabert, Erdan Gu, Igor F. Perepichka, Peter J. Skabara, Martin D. Dawson, Richard A. Pethrick

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24 Citations (Scopus)

Abstract

Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

Original languageEnglish
Pages (from-to)781–785
Number of pages5
JournalAdvanced Materials
Volume21
Issue number7
DOIs
Publication statusPublished - 16 Feb 2009

Keywords

  • photoresist microstructures
  • oligofluorene truxenes
  • vinyl ether photoresist

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    Kuehne, A. J. C., Elfstrom, D., Mackintosh, A. R., Kanibolotsky, A. L., Guilhabert, B., Gu, E., ... Pethrick, R. A. (2009). Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Advanced Materials, 21(7), 781–785. https://doi.org/10.1002/adma.200802656