Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Alexander J. C. Kuehne, David Elfstrom, Allan R. Mackintosh, Alexander L. Kanibolotsky, Benoit Guilhabert, Erdan Gu, Igor F. Perepichka, Peter J. Skabara, Martin D. Dawson, Richard A. Pethrick

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

LanguageEnglish
Pages781–785
Number of pages5
JournalAdvanced Materials
Volume21
Issue number7
DOIs
Publication statusPublished - 16 Feb 2009

Fingerprint

Photoresists
Microstructure
Photooxidation
Lasers
Environmental protection
Stars
Ethers
Nanostructures
Molecules
vinyl ether

Keywords

  • photoresist microstructures
  • oligofluorene truxenes
  • vinyl ether photoresist

Cite this

Kuehne, A. J. C., Elfstrom, D., Mackintosh, A. R., Kanibolotsky, A. L., Guilhabert, B., Gu, E., ... Pethrick, R. A. (2009). Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Advanced Materials, 21(7), 781–785. https://doi.org/10.1002/adma.200802656
Kuehne, Alexander J. C. ; Elfstrom, David ; Mackintosh, Allan R. ; Kanibolotsky, Alexander L. ; Guilhabert, Benoit ; Gu, Erdan ; Perepichka, Igor F. ; Skabara, Peter J. ; Dawson, Martin D. ; Pethrick, Richard A. / Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. In: Advanced Materials. 2009 ; Vol. 21, No. 7. pp. 781–785.
@article{696b154bceef41b9ba30a37ba354cbef,
title = "Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures",
abstract = "Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.",
keywords = "photoresist microstructures , oligofluorene truxenes, vinyl ether photoresist",
author = "Kuehne, {Alexander J. C.} and David Elfstrom and Mackintosh, {Allan R.} and Kanibolotsky, {Alexander L.} and Benoit Guilhabert and Erdan Gu and Perepichka, {Igor F.} and Skabara, {Peter J.} and Dawson, {Martin D.} and Pethrick, {Richard A.}",
year = "2009",
month = "2",
day = "16",
doi = "10.1002/adma.200802656",
language = "English",
volume = "21",
pages = "781–785",
journal = "Advanced Materials",
issn = "1521-4095",
number = "7",

}

Kuehne, AJC, Elfstrom, D, Mackintosh, AR, Kanibolotsky, AL, Guilhabert, B, Gu, E, Perepichka, IF, Skabara, PJ, Dawson, MD & Pethrick, RA 2009, 'Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures' Advanced Materials, vol. 21, no. 7, pp. 781–785. https://doi.org/10.1002/adma.200802656

Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. / Kuehne, Alexander J. C.; Elfstrom, David; Mackintosh, Allan R.; Kanibolotsky, Alexander L.; Guilhabert, Benoit; Gu, Erdan; Perepichka, Igor F.; Skabara, Peter J.; Dawson, Martin D.; Pethrick, Richard A.

In: Advanced Materials, Vol. 21, No. 7, 16.02.2009, p. 781–785.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

AU - Kuehne, Alexander J. C.

AU - Elfstrom, David

AU - Mackintosh, Allan R.

AU - Kanibolotsky, Alexander L.

AU - Guilhabert, Benoit

AU - Gu, Erdan

AU - Perepichka, Igor F.

AU - Skabara, Peter J.

AU - Dawson, Martin D.

AU - Pethrick, Richard A.

PY - 2009/2/16

Y1 - 2009/2/16

N2 - Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

AB - Recently developed star-shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl-ether-based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo-oxidation of the fluorescent molecules.

KW - photoresist microstructures

KW - oligofluorene truxenes

KW - vinyl ether photoresist

U2 - 10.1002/adma.200802656

DO - 10.1002/adma.200802656

M3 - Article

VL - 21

SP - 781

EP - 785

JO - Advanced Materials

T2 - Advanced Materials

JF - Advanced Materials

SN - 1521-4095

IS - 7

ER -