Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix

Aaron Hernandez-Santana, Allan R. Mackintosh, Benoit Guilhabert, Alexander L. Kanibolotsky, Martin D. Dawson, Peter J. Skabara, Duncan Graham

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.

LanguageEnglish
Pages14209-14212
Number of pages4
JournalJournal of Materials Chemistry
Volume21
Issue number37
DOIs
Publication statusPublished - 2011

Fingerprint

Nanolithography
Fluids
Photooxidation
Composite structures
Polymer matrix
Ink
Ultraviolet radiation
Silicon Dioxide
Polymers
Microscopes
Silica
Liquids
Chemical analysis

Keywords

  • oligofluorene truxenes
  • silicon
  • atomic force microscope
  • microphotoluminescence
  • TIC - Bionanotechnology

Cite this

Hernandez-Santana, Aaron ; Mackintosh, Allan R. ; Guilhabert, Benoit ; Kanibolotsky, Alexander L. ; Dawson, Martin D. ; Skabara, Peter J. ; Graham, Duncan. / Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix. In: Journal of Materials Chemistry. 2011 ; Vol. 21, No. 37. pp. 14209-14212.
@article{8c97b850c9e941c285cb5fbd39bc3ecc,
title = "Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix",
abstract = "We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.",
keywords = "oligofluorene truxenes, silicon, atomic force microscope , microphotoluminescence, TIC - Bionanotechnology",
author = "Aaron Hernandez-Santana and Mackintosh, {Allan R.} and Benoit Guilhabert and Kanibolotsky, {Alexander L.} and Dawson, {Martin D.} and Skabara, {Peter J.} and Duncan Graham",
year = "2011",
doi = "10.1039/c1jm11378j",
language = "English",
volume = "21",
pages = "14209--14212",
journal = "Journal of Materials Chemistry",
issn = "0959-9428",
number = "37",

}

Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix. / Hernandez-Santana, Aaron; Mackintosh, Allan R.; Guilhabert, Benoit; Kanibolotsky, Alexander L.; Dawson, Martin D.; Skabara, Peter J.; Graham, Duncan.

In: Journal of Materials Chemistry, Vol. 21, No. 37, 2011, p. 14209-14212.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix

AU - Hernandez-Santana, Aaron

AU - Mackintosh, Allan R.

AU - Guilhabert, Benoit

AU - Kanibolotsky, Alexander L.

AU - Dawson, Martin D.

AU - Skabara, Peter J.

AU - Graham, Duncan

PY - 2011

Y1 - 2011

N2 - We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.

AB - We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.

KW - oligofluorene truxenes

KW - silicon

KW - atomic force microscope

KW - microphotoluminescence

KW - TIC - Bionanotechnology

UR - http://www.scopus.com/inward/record.url?scp=80052542457&partnerID=8YFLogxK

U2 - 10.1039/c1jm11378j

DO - 10.1039/c1jm11378j

M3 - Article

VL - 21

SP - 14209

EP - 14212

JO - Journal of Materials Chemistry

T2 - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

SN - 0959-9428

IS - 37

ER -