Digital illumination in microscale direct-writing photolithography: challenges and trade-off

Mark Stonehouse; Yanchao Zhang; Benoit Guilhabert; Ian Watson; Erdan Gu; Johannes Herrnsdorf; Martin Dawson

Digital illumination in microscale direct-writing photolithography: challenges and trade-off

Mark Stonehouse, Yanchao Zhang, Benoit Guilhabert, Ian Watson, Erdan Gu, Johannes Herrnsdorf, Martin Dawson

Research output: Contribution to conference › Paper › peer-review

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Abstract

We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

Original language	English
Number of pages	4
Publication status	Published - 12 Dec 2018
Event	IEEE British and Irish Conference on Optics and Photonics - London, United Kingdom Duration: 12 Dec 2018 → 14 Dec 2018 https://ieeebicop.com/

Conference

Conference	IEEE British and Irish Conference on Optics and Photonics
Abbreviated title	BICOP 2018
Country/Territory	United Kingdom
City	London
Period	12/12/18 → 14/12/18
Internet address	https://ieeebicop.com/

Keywords

photolithography
complementary metal oxide semiconductor (CMOS)
light emitting diode (LED)
digital illumination

Access to Document

Stonehouse-etal-IEEE-BICOP-2018-Digital-illumination-in-microscale-direct-writing-photolithographyAccepted author manuscript, 3.55 MB

Cite this

@conference{96679c2f69b94abe818bef5d1368ae66,

title = "Digital illumination in microscale direct-writing photolithography: challenges and trade-off",

abstract = "We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.",

keywords = "photolithography, complementary metal oxide semiconductor (CMOS), light emitting diode (LED), digital illumination",

author = "Mark Stonehouse and Yanchao Zhang and Benoit Guilhabert and Ian Watson and Erdan Gu and Johannes Herrnsdorf and Martin Dawson",

year = "2018",

month = dec,

day = "12",

language = "English",

note = "IEEE British and Irish Conference on Optics and Photonics, BICOP 2018 ; Conference date: 12-12-2018 Through 14-12-2018",

url = "https://ieeebicop.com/",

}

TY - CONF

T1 - Digital illumination in microscale direct-writing photolithography

T2 - IEEE British and Irish Conference on Optics and Photonics

AU - Stonehouse, Mark

AU - Zhang, Yanchao

AU - Guilhabert, Benoit

AU - Watson, Ian

AU - Gu, Erdan

AU - Herrnsdorf, Johannes

AU - Dawson, Martin

PY - 2018/12/12

Y1 - 2018/12/12

N2 - We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

AB - We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

KW - photolithography

KW - complementary metal oxide semiconductor (CMOS)

KW - light emitting diode (LED)

KW - digital illumination

UR - https://ieeebicop.com/

M3 - Paper

Y2 - 12 December 2018 through 14 December 2018

ER -

Digital illumination in microscale direct-writing photolithography: challenges and trade-off

Abstract

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Light-controlled manufacturing of semiconductor structures: a platform for next generation processing of photonic devices

Doctoral Training Partnership (DTP 2016-2017 University of Strathclyde) | Stonehouse, Mark

Data for: "Bringing Digital Illumination to the Microscopic Scale: Challenges and Trade-Offs"

Cite this

Digital illumination in microscale direct-writing photolithography: challenges and trade-off

Abstract

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Projects

Light-controlled manufacturing of semiconductor structures: a platform for next generation processing of photonic devices

Doctoral Training Partnership (DTP 2016-2017 University of Strathclyde) | Stonehouse, Mark

Datasets

Data for: "Bringing Digital Illumination to the Microscopic Scale: Challenges and Trade-Offs"

Cite this