Digital illumination in microscale direct-writing photolithography: challenges and trade-off

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Abstract

We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.
Original languageEnglish
Number of pages4
Publication statusPublished - 12 Dec 2018
EventIEEE British and Irish Conference on Optics and Photonics - London, United Kingdom
Duration: 12 Dec 201814 Dec 2018
https://ieeebicop.com/

Conference

ConferenceIEEE British and Irish Conference on Optics and Photonics
Abbreviated titleBICOP 2018
CountryUnited Kingdom
CityLondon
Period12/12/1814/12/18
Internet address

Keywords

  • photolithography
  • complementary metal oxide semiconductor (CMOS)
  • light emitting diode (LED)
  • digital illumination

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    Stonehouse, M., Zhang, Y., Guilhabert, B., Watson, I., Gu, E., Herrnsdorf, J., & Dawson, M. (2018). Digital illumination in microscale direct-writing photolithography: challenges and trade-off. Paper presented at IEEE British and Irish Conference on Optics and Photonics, London, United Kingdom.