Digital illumination in microscale direct-writing photolithography: challenges and trade-off

Research output: Contribution to conferencePaper

Abstract

We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

Conference

ConferenceIEEE British and Irish Conference on Optics and Photonics
Abbreviated titleBICOP 2018
CountryUnited Kingdom
CityLondon
Period12/12/1814/12/18
Internet address

Fingerprint

photolithography
curing
microbalances
radiant flux density
CMOS
light emitting diodes
illumination
requirements

Keywords

  • photolithography
  • complementary metal oxide semiconductor (CMOS)
  • light emitting diode (LED)
  • digital illumination

Cite this

Stonehouse, M., Zhang, Y., Guilhabert, B., Watson, I., Gu, E., Herrnsdorf, J., & Dawson, M. (2018). Digital illumination in microscale direct-writing photolithography: challenges and trade-off. Paper presented at IEEE British and Irish Conference on Optics and Photonics, London, United Kingdom.
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abstract = "We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.",
keywords = "photolithography, complementary metal oxide semiconductor (CMOS), light emitting diode (LED), digital illumination",
author = "Mark Stonehouse and Yanchao Zhang and Benoit Guilhabert and Ian Watson and Erdan Gu and Johannes Herrnsdorf and Martin Dawson",
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Stonehouse, M, Zhang, Y, Guilhabert, B, Watson, I, Gu, E, Herrnsdorf, J & Dawson, M 2018, 'Digital illumination in microscale direct-writing photolithography: challenges and trade-off' Paper presented at IEEE British and Irish Conference on Optics and Photonics, London, United Kingdom, 12/12/18 - 14/12/18, .

Digital illumination in microscale direct-writing photolithography : challenges and trade-off. / Stonehouse, Mark; Zhang, Yanchao; Guilhabert, Benoit; Watson, Ian; Gu, Erdan; Herrnsdorf, Johannes; Dawson, Martin.

2018. Paper presented at IEEE British and Irish Conference on Optics and Photonics, London, United Kingdom.

Research output: Contribution to conferencePaper

TY - CONF

T1 - Digital illumination in microscale direct-writing photolithography

T2 - challenges and trade-off

AU - Stonehouse, Mark

AU - Zhang, Yanchao

AU - Guilhabert, Benoit

AU - Watson, Ian

AU - Gu, Erdan

AU - Herrnsdorf, Johannes

AU - Dawson, Martin

PY - 2018/12/12

Y1 - 2018/12/12

N2 - We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

AB - We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.

KW - photolithography

KW - complementary metal oxide semiconductor (CMOS)

KW - light emitting diode (LED)

KW - digital illumination

UR - https://ieeebicop.com/

M3 - Paper

ER -

Stonehouse M, Zhang Y, Guilhabert B, Watson I, Gu E, Herrnsdorf J et al. Digital illumination in microscale direct-writing photolithography: challenges and trade-off. 2018. Paper presented at IEEE British and Irish Conference on Optics and Photonics, London, United Kingdom.