Abstract
Language | English |
---|---|
Pages | 7932-7935 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 519 |
Issue number | 22 |
Early online date | 18 Jul 2011 |
DOIs | |
Publication status | Published - 1 Sep 2011 |
Fingerprint
Keywords
- density
- silicon-on-insulator
- silicon nitride
- silicon carbide
- micro-electromechanical systems
- micro-cantilevers
Cite this
}
Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures. / Boyd, E.J.; Nock, V.; Li, X.; Uttamchandani, D.
In: Thin Solid Films, Vol. 519, No. 22, 01.09.2011, p. 7932-7935.Research output: Contribution to journal › Article
TY - JOUR
T1 - Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures
AU - Boyd, E.J.
AU - Nock, V.
AU - Li, X.
AU - Uttamchandani, D.
PY - 2011/9/1
Y1 - 2011/9/1
N2 - The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.
AB - The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.
KW - density
KW - silicon-on-insulator
KW - silicon nitride
KW - silicon carbide
KW - micro-electromechanical systems
KW - micro-cantilevers
UR - http://www.scopus.com/inward/record.url?scp=80052121234&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2011.07.017
DO - 10.1016/j.tsf.2011.07.017
M3 - Article
VL - 519
SP - 7932
EP - 7935
JO - Thin Solid Films
T2 - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 22
ER -