Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures

E.J. Boyd, V. Nock, X. Li, D. Uttamchandani

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.
LanguageEnglish
Pages7932-7935
Number of pages4
JournalThin Solid Films
Volume519
Issue number22
Early online date18 Jul 2011
DOIs
Publication statusPublished - 1 Sep 2011

Fingerprint

microelectromechanical systems
MEMS
Silicon
Silicon nitride
Silicon carbide
Thin films
thin films
silicon nitrides
silicon carbides
Euler equations
Bernoulli theorem
Natural frequencies
frequency measurement
silicon
carbides
nitrides
resonant frequencies
deflection
Fabrication
fabrication

Keywords

  • density
  • silicon-on-insulator
  • silicon nitride
  • silicon carbide
  • micro-electromechanical systems
  • micro-cantilevers

Cite this

@article{a5866bb3c6f242e9a718fcfc6b97d9e1,
title = "Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures",
abstract = "The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.",
keywords = "density, silicon-on-insulator, silicon nitride , silicon carbide, micro-electromechanical systems, micro-cantilevers",
author = "E.J. Boyd and V. Nock and X. Li and D. Uttamchandani",
year = "2011",
month = "9",
day = "1",
doi = "10.1016/j.tsf.2011.07.017",
language = "English",
volume = "519",
pages = "7932--7935",
journal = "Thin Solid Films",
issn = "0040-6090",
number = "22",

}

Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures. / Boyd, E.J.; Nock, V.; Li, X.; Uttamchandani, D.

In: Thin Solid Films, Vol. 519, No. 22, 01.09.2011, p. 7932-7935.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures

AU - Boyd, E.J.

AU - Nock, V.

AU - Li, X.

AU - Uttamchandani, D.

PY - 2011/9/1

Y1 - 2011/9/1

N2 - The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.

AB - The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.

KW - density

KW - silicon-on-insulator

KW - silicon nitride

KW - silicon carbide

KW - micro-electromechanical systems

KW - micro-cantilevers

UR - http://www.scopus.com/inward/record.url?scp=80052121234&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2011.07.017

DO - 10.1016/j.tsf.2011.07.017

M3 - Article

VL - 519

SP - 7932

EP - 7935

JO - Thin Solid Films

T2 - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 22

ER -