Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures

E.J. Boyd, V. Nock, X. Li, D. Uttamchandani

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.
Original languageEnglish
Pages (from-to)7932-7935
Number of pages4
JournalThin Solid Films
Volume519
Issue number22
Early online date18 Jul 2011
DOIs
Publication statusPublished - 1 Sep 2011

Keywords

  • density
  • silicon-on-insulator
  • silicon nitride
  • silicon carbide
  • micro-electromechanical systems
  • micro-cantilevers

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