CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring

U. Vogt, A. Vital, T. Graule, W. Graehlert, M. Leparoux, V. Hopfe, H.C. Ewing, R. Daum, A. Beil

Research output: Contribution to conferencePaper

Abstract

High strength and high temperature composite materials such as CMCs represent a very promising family of future materials. A high temperature CVD-process has been developed to produce a new type of high-performance amorphous silicon-oxynitride (Si-N-O) fibres. The fibres were grown on a SiC substrate at 1450°C exposing a stoichiometric precursor powder mixture of SiO2 + SiC, doped with 10 wt% Ti powder to flowing NH3. To improve CVD process control an in-situ FTIR monitoring system is in development. For application of a FTIR based monitoring to the fibre growth process a specific optical adaptation has been designed onto the growth reactor. The optical set-up allows an almost simultaneous in-situ measurement of the transmission and emission of the hot gas atmosphere just above the precursor powder mixture. In addition to the decomposition of NH3, different reaction products have been identified, such as CO, HCN and CH4. Gaseous Si-O species could be detected which are responsible for the silicon transport in the gas phase from the solid SiO2 precursor powder to the fibre growth position. The assessment of the SiO bands has been supported by additional experiments which promote the formation of gaseous SiO.
LanguageEnglish
Pages315-322
Number of pages7
Publication statusPublished - Jan 2001
EventProceedings of Ceramic Engineering and Science Conference - Braunschweig, Germany
Duration: 1 Jan 2001 → …

Conference

ConferenceProceedings of Ceramic Engineering and Science Conference
CityBraunschweig, Germany
Period1/01/01 → …

Fingerprint

Silicon
Powders
Chemical vapor deposition
Fibers
Monitoring
Gases
Carbon Monoxide
Amorphous silicon
Reaction products
Process control
Decomposition
Temperature
Composite materials
Substrates
Experiments

Keywords

  • materials science
  • physical chemistry
  • applied physics
  • spectroscopic monitoring

Cite this

Vogt, U., Vital, A., Graule, T., Graehlert, W., Leparoux, M., Hopfe, V., ... Beil, A. (2001). CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring. 315-322. Paper presented at Proceedings of Ceramic Engineering and Science Conference, Braunschweig, Germany, .
Vogt, U. ; Vital, A. ; Graule, T. ; Graehlert, W. ; Leparoux, M. ; Hopfe, V. ; Ewing, H.C. ; Daum, R. ; Beil, A. / CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring. Paper presented at Proceedings of Ceramic Engineering and Science Conference, Braunschweig, Germany, .7 p.
@conference{4c9d315107bc479e9136d41ec2d4fcad,
title = "CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring",
abstract = "High strength and high temperature composite materials such as CMCs represent a very promising family of future materials. A high temperature CVD-process has been developed to produce a new type of high-performance amorphous silicon-oxynitride (Si-N-O) fibres. The fibres were grown on a SiC substrate at 1450°C exposing a stoichiometric precursor powder mixture of SiO2 + SiC, doped with 10 wt{\%} Ti powder to flowing NH3. To improve CVD process control an in-situ FTIR monitoring system is in development. For application of a FTIR based monitoring to the fibre growth process a specific optical adaptation has been designed onto the growth reactor. The optical set-up allows an almost simultaneous in-situ measurement of the transmission and emission of the hot gas atmosphere just above the precursor powder mixture. In addition to the decomposition of NH3, different reaction products have been identified, such as CO, HCN and CH4. Gaseous Si-O species could be detected which are responsible for the silicon transport in the gas phase from the solid SiO2 precursor powder to the fibre growth position. The assessment of the SiO bands has been supported by additional experiments which promote the formation of gaseous SiO.",
keywords = "materials science, physical chemistry, applied physics, spectroscopic monitoring",
author = "U. Vogt and A. Vital and T. Graule and W. Graehlert and M. Leparoux and V. Hopfe and H.C. Ewing and R. Daum and A. Beil",
year = "2001",
month = "1",
language = "English",
pages = "315--322",
note = "Proceedings of Ceramic Engineering and Science Conference ; Conference date: 01-01-2001",

}

Vogt, U, Vital, A, Graule, T, Graehlert, W, Leparoux, M, Hopfe, V, Ewing, HC, Daum, R & Beil, A 2001, 'CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring' Paper presented at Proceedings of Ceramic Engineering and Science Conference, Braunschweig, Germany, 1/01/01, pp. 315-322.

CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring. / Vogt, U.; Vital, A.; Graule, T.; Graehlert, W.; Leparoux, M.; Hopfe, V.; Ewing, H.C.; Daum, R.; Beil, A.

2001. 315-322 Paper presented at Proceedings of Ceramic Engineering and Science Conference, Braunschweig, Germany, .

Research output: Contribution to conferencePaper

TY - CONF

T1 - CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring

AU - Vogt, U.

AU - Vital, A.

AU - Graule, T.

AU - Graehlert, W.

AU - Leparoux, M.

AU - Hopfe, V.

AU - Ewing, H.C.

AU - Daum, R.

AU - Beil, A.

PY - 2001/1

Y1 - 2001/1

N2 - High strength and high temperature composite materials such as CMCs represent a very promising family of future materials. A high temperature CVD-process has been developed to produce a new type of high-performance amorphous silicon-oxynitride (Si-N-O) fibres. The fibres were grown on a SiC substrate at 1450°C exposing a stoichiometric precursor powder mixture of SiO2 + SiC, doped with 10 wt% Ti powder to flowing NH3. To improve CVD process control an in-situ FTIR monitoring system is in development. For application of a FTIR based monitoring to the fibre growth process a specific optical adaptation has been designed onto the growth reactor. The optical set-up allows an almost simultaneous in-situ measurement of the transmission and emission of the hot gas atmosphere just above the precursor powder mixture. In addition to the decomposition of NH3, different reaction products have been identified, such as CO, HCN and CH4. Gaseous Si-O species could be detected which are responsible for the silicon transport in the gas phase from the solid SiO2 precursor powder to the fibre growth position. The assessment of the SiO bands has been supported by additional experiments which promote the formation of gaseous SiO.

AB - High strength and high temperature composite materials such as CMCs represent a very promising family of future materials. A high temperature CVD-process has been developed to produce a new type of high-performance amorphous silicon-oxynitride (Si-N-O) fibres. The fibres were grown on a SiC substrate at 1450°C exposing a stoichiometric precursor powder mixture of SiO2 + SiC, doped with 10 wt% Ti powder to flowing NH3. To improve CVD process control an in-situ FTIR monitoring system is in development. For application of a FTIR based monitoring to the fibre growth process a specific optical adaptation has been designed onto the growth reactor. The optical set-up allows an almost simultaneous in-situ measurement of the transmission and emission of the hot gas atmosphere just above the precursor powder mixture. In addition to the decomposition of NH3, different reaction products have been identified, such as CO, HCN and CH4. Gaseous Si-O species could be detected which are responsible for the silicon transport in the gas phase from the solid SiO2 precursor powder to the fibre growth position. The assessment of the SiO bands has been supported by additional experiments which promote the formation of gaseous SiO.

KW - materials science

KW - physical chemistry

KW - applied physics

KW - spectroscopic monitoring

UR - http://dx.doi.org/10.1051/jp4:2000206

M3 - Paper

SP - 315

EP - 322

ER -

Vogt U, Vital A, Graule T, Graehlert W, Leparoux M, Hopfe V et al. CVD process for Si-N-O fibre growth controlled by in-situ FTIR spectroscopic monitoring. 2001. Paper presented at Proceedings of Ceramic Engineering and Science Conference, Braunschweig, Germany, .