Abstract
Nucleation and growth of highly crystalline silicon nanoparticles in atmospheric-pressure low-temperature microplasmas at gas temperatures well below the Si crystallization threshold and within a short (100 μs) period of time are demonstrated and explained. The modeling reveals that collision-enhanced ion fluxes can effectively increase the heat flux on the nanoparticle surface and this heating is controlled by the ion density. It is shown that nanoparticles can be heated to temperatures above the crystallization threshold. These combined experimental and theoretical results confirm the effective heating and structure control of Si nanoparticles at atmospheric pressure and low gas temperatures.
| Original language | English |
|---|---|
| Article number | 163103 |
| Journal | Applied Physics Letters |
| Volume | 104 |
| Issue number | 16 |
| DOIs | |
| Publication status | Published - 21 Apr 2014 |
Funding
This work was supported by the Royal Society International Exchange Scheme (IE120884), the Leverhulme International Network (IN-2012-136), and EPSRC (EP/K022237/1). S.A. thanks the financial support of the University of Ulster Vice-Chancellor Studentship. I.L. and K.O. acknowledge financial support from CSIRO and Australian Research Council.
Keywords
- electron density
- physical quantities
- thermodynamic states and processes
- Stark effect
- Nanoparticle
- leptons
- silicon compounds
- chemical elements
- plasmas
- fluid mechancis